Effect of oxygen plasma exposure of porous spin-on-glass films

2000 ◽  
Vol 18 (3) ◽  
pp. 1276 ◽  
Author(s):  
E. Kondoh ◽  
T. Asano ◽  
A. Nakashima ◽  
M. Komatu
Keyword(s):  
Oxygen Plasma ◽  
Plasma Exposure ◽  
Effect Of Oxygen ◽  
Glass Films

Effect of Oxygen Plasma on the Optical Properties of Monolayer Graphene

2014 ◽  
Vol 896 ◽  
pp. 510-513 ◽  
Author(s):  
Iman Santoso ◽  
Ram Sevak Singh ◽  
Pranjal Kumar Gogoi ◽  
Teguh Citra Asmara ◽  
Da Cheng Wei ◽  
...  
Keyword(s):  
Oxygen Plasma ◽  
Near Infrared ◽  
Structure Constant ◽  
Resonance Peak ◽  
Fine Structure Constant ◽  
Monolayer Graphene ◽  
Infrared Range ◽  
Plasma Exposure ◽  
Effect Of Oxygen ◽  
Excitonic Resonance

The significant alteration of absorption (A) of monolayer graphene under mild oxygen plasma exposure has been observed. The first important effect is the reduction of the excitonic resonance peak at 4.64 eV. Secondly, in the near infrared range, A is gradually suppressed below an exposure-dependent threshold in sense that A << A0. Quantity A0 (given by πα and α is the fine structure constant) denotes constant absorption and relates to universal optical conductivity σ0. The suppression of A0 can be thought as the weakening of electron-hole interaction as displayed by the reduction of the excitonic resonance peak at 4.64 eV. The weakening of this interaction is due to the disorder introduced by the oxygen plasma exposure.

Effect of Oxygen Plasma Treatment on Characteristics of TiO$_{2}$ Photodetectors

2011 ◽  
Vol 11 (11) ◽  
pp. 3031-3035 ◽  
Author(s):  
W. S. Shih ◽  
S. J. Young ◽  
L. W. Ji ◽  
W. Water ◽  
T. H. Meen ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Oxygen Plasma ◽  
Oxygen Plasma Treatment ◽  
Effect Of Oxygen

Effect of oxygen plasma on the surface states of ZnO films used to produce thin-film transistors on soft plastic sheets

2013 ◽  
Vol 1 (40) ◽  
pp. 6613 ◽  
Author(s):  
Jagan Singh Meena ◽  
Min-Ching Chu ◽  
Yu-Cheng Chang ◽  
Hsin-Chiang You ◽  
Ranjodh Singh ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Transistors ◽  
Oxygen Plasma ◽  
Surface States ◽  
Zno Films ◽  
Effect Of Oxygen

Effect of oxygen plasma treatment on performance of ZnO based dye sensitized solar cells

2017 ◽  
Vol 724 ◽  
pp. 348-352 ◽  
Author(s):  
Shubhangi Khadtare ◽  
Avinash S. Bansode ◽  
V.L. Mathe ◽  
Nabeen K. Shrestha ◽  
Chinna Bathula ◽  
...  
Keyword(s):  
Solar Cells ◽  
Plasma Treatment ◽  
Oxygen Plasma ◽  
Dye Sensitized Solar Cells ◽  
Oxygen Plasma Treatment ◽  
Dye Sensitized ◽  
Effect Of Oxygen ◽  
Sensitized Solar Cells

Plasma Sterilization: Spore Destruction by Microwave Plasmas

1998 ◽  
Vol 544 ◽  
Author(s):  
S. Lerouge ◽  
A. C. Fozza ◽  
M. R. Wertheimer ◽  
R. Marchand ◽  
M. Tabrizian ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Oxygen Plasma ◽  
Synthetic Polymers ◽  
Pure Oxygen ◽  
Gas Composition ◽  
Coating Structure ◽  
Plasma Exposure ◽  
Microwave Plasmas ◽  
Plasma Sterilization ◽  
Scanning Electron

AbstractLow-pressure plasmas are now being used for sterilization at ambient temperature. In this work, we have studied the possible mechanism of spore destruction by plasma, and compare it with etching of synthetic polymers. Bacillus subtilis spores were inoculated at the bottom of special glass vials and subjected to different plasma gas compositions, all known to etch polymers. The mortality rate of spores was found to vary with gas composition, between less than a 2 log decrease in 8 minutes for a pure oxygen plasma, to a 6 log decrease with 02CF4 mixture. Examination by scanning electron microscopy (SEM) showed that spores were significantly etched after 30 minutes of plasma exposure, but not completely. We speculate about their etch resistance, compared with that of synthetic polymers, on the basis of their morphology and their complex coating structure.

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