Comparative study of two-dimensional junction profiling using a dopant selective etching method and the scanning capacitance spectroscopy method

Author(s):  
R. Mahaffy ◽  
C. K. Shih ◽  
H. Edwards
1990 ◽  
Vol 2 (1) ◽  
pp. 47-60 ◽  
Author(s):  
T. Passot ◽  
H. Politano ◽  
A. Pouquet ◽  
P. L. Sulem

Sign in / Sign up

Export Citation Format

Share Document