Electron beam lithography process for T- and Γ-shaped gate fabrication using chemically amplified DUV resists and PMMA

1999 ◽  
Vol 17 (6) ◽  
pp. 2507 ◽  
Author(s):  
Y. Chen ◽  
D. Macintyre ◽  
S. Thoms
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Lithography Process ◽  
Chemically Amplified

Application of a New Empirical Model to the Electron Beam Lithography Process with Chemically Amplified Resists

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6761-6766 ◽  
Author(s):  
Young-Mog Ham ◽  
Ki-Ho Baik ◽  
Won-Gyu Lee ◽  
Tack Dong Chung ◽  
Kukjin Chun
Keyword(s):  
Electron Beam ◽  
Empirical Model ◽  
Electron Beam Lithography ◽  
Lithography Process ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Salicidation process for submicrometre gate MOSFET fabrication using a resistless electron beam lithography process

1999 ◽  
Vol 35 (15) ◽  
pp. 1283 ◽  
Author(s):  
S. Michel ◽  
E. Lavallée ◽  
J. Beauvais ◽  
J. Mouine
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Lithography Process

Sub-150-nm electron-beam lithography using AZPN114 chemically amplified resist

1997 ◽  
Author(s):  
Zheng Cui ◽  
R. A. Moody ◽  
Ian M. Loader ◽  
John G. Watson ◽  
Philip D. Prewett
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
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