Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography

1999 ◽  
Vol 17 (6) ◽  
pp. 2970 ◽  
Author(s):  
G. F. Cardinale ◽  
C. C. Henderson ◽  
J. E. M. Goldsmith ◽  
P. J. S. Mangat ◽  
J. Cobb ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Pattern Transfer ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Line Space

Novel Anionic Photoacid Generators (PAGs) and Photoresists for sub 50 nm Patterning by EUVL and EBL

2006 ◽  
Vol 961 ◽  
Author(s):  
Mingxing Wang ◽  
Cheng-Tsung Lee ◽  
Clifford L Henderson ◽  
Wang Yueh ◽  
Jeanette M Roberts ◽  
...  
Keyword(s):  
Main Chain ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Polymer Main Chain ◽  
Acid Diffusion ◽  
Photoacid Generators ◽  
20 Nm ◽  
Line Space

ABSTRACTA new series of anionic photoacid generators (PAGs), and corresponding polymers were prepared. The thermostability of PAG bound polymers was superior to PAG blend polymers. PAG incorporated into the polymer main chain may improve acid diffusion compared with the PAG blend polymers, which was demonstrated by Extreme Ultraviolet lithography (EUVL) results: the fluorine PAG bound polymer resist gave 45 nm (1:1), 35 nm (1:2), 30 nm (1:3) and 20 nm (1:4) Line/Space as well as 50 nm (1:1) elbow patterned, showed better resolution than the blend sample.

Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance

2019 ◽  
Vol 52 (3) ◽  
pp. 886-895 ◽  
Author(s):  
Matthias S. Ober ◽  
Duane R. Romer ◽  
John Etienne ◽  
P. J. Thomas ◽  
Vipul Jain ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Sensitivity

Demonstration of phase-shift masks for extreme-ultraviolet lithography

2006 ◽  
Author(s):  
Bruno La Fontaine ◽  
Adam R. Pawloski ◽  
Obert Wood ◽  
Yunfei Deng ◽  
Harry J. Levinson ◽  
...  
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

Influence of MEEF change on the mask shadowing effect in extreme ultraviolet lithography

2010 ◽  
Vol 87 (11) ◽  
pp. 2134-2138 ◽  
Author(s):  
Chang Young Jeong ◽  
Sangsul Lee ◽  
Hyun-Duck Shin ◽  
Tae Geun Kim ◽  
Jinho Ahn
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Shadowing Effect

Laser Shock Removal of Nanoparticles from Si Capping Layer of Extreme Ultraviolet Lithography Masks

2005 ◽  
Vol 44 (7B) ◽  
pp. 5560-5564 ◽  
Author(s):  
Sang-Ho Lee ◽  
Young-Jae Kang ◽  
Jin-Goo Park ◽  
Ahmed A. Busnaina ◽  
Jong-Myung Lee ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Laser Shock ◽  
Ultraviolet Lithography ◽  
Capping Layer
Sign in / Sign up

Export Citation Format

Share Document