Structural characterization of ultrathin nanocrystalline silicon films formed by annealing amorphous silicon

1998 ◽  
Vol 16 (5) ◽  
pp. 2802 ◽  
Author(s):  
J. Lützen
Keyword(s):  
Amorphous Silicon ◽  
Structural Characterization ◽  
Nanocrystalline Silicon ◽  
Silicon Films ◽  
Nanocrystalline Silicon Films

Characterization of nanocrystalline silicon films

2001 ◽  
Author(s):  
Hongyi Lin ◽  
Jinhua Liu ◽  
Bo Liao ◽  
Daoming Yang ◽  
Yue Wang
Keyword(s):  
Nanocrystalline Silicon ◽  
Silicon Films ◽  
Nanocrystalline Silicon Films

Plasma deposition and characterization of photoluminescent fluorinated nanocrystalline silicon films

1996 ◽  
Vol 80 (11) ◽  
pp. 6564-6566 ◽  
Author(s):  
G. Cicala ◽  
P. Capezzuto ◽  
G. Bruno ◽  
L. Schiavulli ◽  
G. Perna ◽  
...  
Keyword(s):  
Plasma Deposition ◽  
Nanocrystalline Silicon ◽  
Silicon Films ◽  
Nanocrystalline Silicon Films

Structural characterization of stable amorphous silicon films

2002 ◽  
Vol 122 (5) ◽  
pp. 283-286 ◽  
Author(s):  
Shibin Zhang ◽  
Guanglin Kong ◽  
Yongqian Wang ◽  
Shuran Sheng ◽  
Xianbo Liao
Keyword(s):  
Amorphous Silicon ◽  
Structural Characterization ◽  
Silicon Films

Nanocrystalline silicon ( nc-Si ) from single ion beam sputtering

2003 ◽  
Vol 762 ◽  
Author(s):  
Z.B. Zhou ◽  
G.M. Hadi ◽  
R.Q. Cui ◽  
Z.M. Ding ◽  
G. Li
Keyword(s):  
Solar Cell ◽  
Ion Beam ◽  
Nanocrystalline Silicon ◽  
Silicon Films ◽  
Chamber Pressure ◽  
Ion Beam Sputtering ◽  
High Hydrogen ◽  
Beam Sputtering ◽  
Si Films ◽  
Nanocrystalline Silicon Films

AbstractBased on a small set of selected publications on the using of nanocrystalline silicon films (nc-Si) for solar cell from 1997 to 2001, this paper reviews the application of nc-Si films as intrinsic layers in p-i-n solar cells. The new structure of nc-Si films deposited at high chamber pressure and high hydrogen dilution have characters of nanocrystalline grains with dimension about several tens of nanometer embedded in matrix of amorphous tissue and a high volume fraction of crystallinity (60~80%). The new nc-Si material have optical gap of 1.89 eV. The efficiency of this single junction solar cell reaches 8.7%. This nc-Si layer can be used not only as an intrinsic layer and as a p-type layer. Also nanocrystalline layer may be used as a seed layer for the growth of polycrystalline Si films at a low temperature.We used single ion beam sputtering methods to synthesize nanocrystalline silicon films successfully. The films were characterized with the technique of X-ray diffraction, Atomic Force Micrographs. We found that the films had a character of nc-amorphous double phase structure. Conductivity test at different temperatures presented the transportation of electrons dominated by different mechanism within different temperature ranges. Photoconductivity gains of the material were obtained in our recent investigation.

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