Analysis of electron emission degradation in silicon field emitter arrays

1998 ◽  
Vol 16 (2) ◽  
pp. 815 ◽  
Author(s):  
Yoon-Ho Song
Keyword(s):  
Electron Emission ◽  
Field Emitter ◽  
Field Emitter Arrays

Gold Overcoatings on Spindt-Type Field Emitter Arrays

1996 ◽  
Vol 424 ◽  
Author(s):  
S. L. Skala ◽  
D. A. Ohlberg ◽  
A. A. Talin ◽  
T. E. Felter
Keyword(s):  
Electron Emission ◽  
Current Noise ◽  
Gold Deposition ◽  
Field Emitter ◽  
Emission Properties ◽  
Turn On ◽  
Field Emitter Arrays ◽  
Before And After ◽  
Emitter Array ◽  
Field Emitter Array

ABSTRACTThe electron emission properties of a Spindt-type field emitter array have been measured before and after deposition of approximately 100 Å of gold. The workfunction of the emitter decreased by 5% after gold deposition resulting in an 11% reduction in turn-on voltage. Emission stability as measured by RMS current noise improved by 40%. Improvements in emission do not withstand exposure to air. However, baking at moderate temperatures (200°C) restores the emission improvements obtained with the gold overcoating. Fowler-Nordheim plots show that the enhanced emission after baking is due to a increase of the Fowler-Nordheim intercept and not a decrease in slope. Additionally, the gold over coatings resist poisoning as a 50,000 L dose of oxygen only slightly affects emission.

Laser-induced surface cleaning of molybdenum field emitter arrays for enhanced electron emission

2003 ◽  
Vol 82 (19) ◽  
pp. 3299-3301 ◽  
Author(s):  
D. S. Seo ◽  
C. O. Kim ◽  
J. P. Hong ◽  
J. S. Shin ◽  
B. K. Song ◽  
...  
Keyword(s):  
Electron Emission ◽  
Surface Cleaning ◽  
Field Emitter ◽  
Field Emitter Arrays

scholarly journals The effect of Pd coating on electron emission from silicon field emitter arrays

2000 ◽  
Vol 87 (10) ◽  
pp. 7349-7353 ◽  
Author(s):  
Jong-Lam Lee ◽  
Sang Pyo Oh ◽  
Sang Youn Han ◽  
Seung-Youl Kang ◽  
Jin Ho Lee ◽  
...  
Keyword(s):  
Electron Emission ◽  
Field Emitter ◽  
Field Emitter Arrays ◽  
Effect Of Pd

Pulsed Laser Deposition of Diamond-Like Carbon Films on Gated Si Field Emitter Arrays for Improved Electron Emission

1999 ◽  
Vol 38 (Part 1, No. 12B) ◽  
pp. 7208-7212 ◽  
Author(s):  
Oguz Yavas ◽  
Takeshi Hashimoto ◽  
Naoki Suzuki ◽  
Mikio Takai ◽  
Michihiro Kobayashi ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Electron Emission ◽  
Pulsed Laser ◽  
Carbon Films ◽  
Laser Deposition ◽  
Diamond Like Carbon ◽  
Field Emitter ◽  
Field Emitter Arrays

Electron Emission from Gated Diamond Emitter Array

1998 ◽  
Vol 509 ◽  
Author(s):  
Seung -Chul Ha ◽  
Dae-Hwan Kang ◽  
Byung-Sung Kim ◽  
Seok-Hong Min ◽  
Ki-Bum Kim
Keyword(s):  
Electron Emission ◽  
Silicon Substrate ◽  
Current Level ◽  
Selective Deposition ◽  
Processing Scheme ◽  
Electrode Layer ◽  
Field Emitter ◽  
Field Emitter Arrays ◽  
Emitter Array ◽  
Novel Processing

AbstractA novel processing sequence for the formation of gated diamond field emitter arrays (triode system) is proposed and the feasibility is tested by investigating the field emission property. The processing scheme is based on the selective deposition of diamond using the well established nucleation enhanced process on silicon substrate, so called bias enhanced nucleation (BEN). Selective deposition of diamond using the same process was also demonstrated on titanium nitride (TIN) electrode layer. Our preliminary results show that the diamond field emitter is turned on at around 97 V/μm with the current level of about several μA.

Electron Emission Properties of Si Field Emitter Arrays Coated With Nanocrystalline Diamond From Fullerene Precursors

1997 ◽  
Vol 498 ◽  
Author(s):  
T. G. McCauley ◽  
T. D. Corrigan ◽  
A. R. Krauss ◽  
O. Auciello ◽  
D. Zhou ◽  
...  
Keyword(s):  
Field Emission ◽  
Electron Emission ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Nanocrystalline Diamond ◽  
Threshold Field ◽  
Field Emitter ◽  
Effective Work ◽  
Field Emitter Arrays ◽  
Electron Field

ABSTRACTIn this paper, we report on a substantial lowering of the threshold field for electron field emission from Si field emitter arrays (FEA), which have been coated with a thin layer of nanocrystalline diamond by microwave plasma-assisted chemical vapor deposition (MPCVD) from fullerene (C60) and methane (CH4) precursors. The field emission characteristics were investigated and the emission sites imaged using photoelectron emission microscopy (PEEM). Electron emission from these Si FEAs coated with nanocrystalline diamond was observed at threshold fields as low as 3 V/μm, with effective work functions as low as 0.59 eV.

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