Electron optical system for the x-ray mask writer EB-X2

Kenichi Saito

doi:10.1116/1.589629

A 100-kV, 100-A/cm/sup 2/ electron optical system for the EB-X3 X-ray mask writer

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) ◽

10.1109/imnc.2000.872682 ◽

2002 ◽

Author(s):

K. Saito ◽

J. Kato ◽

T. Matsuda ◽

Y. Nakayama

Keyword(s):

Optical System ◽

Electron Optical System ◽

X Ray

Download Full-text

Electron Optical System for Micro-Focused X-ray Source with Carbon Nanotubes Field Emitter

2006 19th International Vacuum Nanoelectronics Conference ◽

10.1109/ivnc.2006.335251 ◽

2006 ◽

Author(s):

Koichi Hata ◽

Kunihiko Kawakita ◽

Hideki Sato ◽

Yahachi Saito

Keyword(s):

Carbon Nanotubes ◽

Optical System ◽

Electron Optical System ◽

Field Emitter ◽

X Ray

Download Full-text

Electron optical system for the x-ray mask writer EB-X3

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.591095 ◽

1999 ◽

Vol 17 (6) ◽

pp. 2912 ◽

Cited By ~ 4

Author(s):

Kenichi Saito ◽

Junichi Kato ◽

Akira Shimizu ◽

Hirofumi Morita ◽

Tadahito Matsuda ◽

...

Keyword(s):

Optical System ◽

Electron Optical System ◽

X Ray

Download Full-text

A Field Emission System For Transmission Electron Microscopy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100071934 ◽

1973 ◽

Vol 31 ◽

pp. 298-299

Author(s):

Michel Troyonal ◽

Huei Pei Kuoal ◽

Benjamin M. Siegelal

Keyword(s):

Electron Microscope ◽

Field Emission ◽

Optical System ◽

High Vacuum ◽

Ultra High Vacuum ◽

Objective Lens ◽

Electron Optical System ◽

Cross Sectional ◽

Transmission Electron ◽

Emission System

A field emission system for our experimental ultra high vacuum electron microscope has been designed, constructed and tested. The electron optical system is based on the prototype whose performance has already been reported. A cross-sectional schematic illustrating the field emission source, preaccelerator lens and accelerator is given in Fig. 1. This field emission system is designed to be used with an electron microscope operated at 100-150kV in the conventional transmission mode. The electron optical system used to control the imaging of the field emission beam on the specimen consists of a weak condenser lens and the pre-field of a strong objective lens. The pre-accelerator lens is an einzel lens and is operated together with the accelerator in the constant angular magnification mode (CAM).

Download Full-text

Atomic Resolution in Crystal Aperture Stem

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100179932 ◽

1990 ◽

Vol 48 (1) ◽

pp. 236-237

Author(s):

J T Fourie

Keyword(s):

Optical System ◽

Spherical Aberration ◽

Three Dimensional ◽

Transmission Function ◽

Optical Systems ◽

Bragg Angle ◽

Electron Optical System ◽

Intimate Contact ◽

Diffraction Effects ◽

Design Aspect

The attempts at improvement of electron optical systems to date, have largely been directed towards the design aspect of magnetic lenses and towards the establishment of ideal lens combinations. In the present work the emphasis has been placed on the utilization of a unique three-dimensional crystal objective aperture within a standard electron optical system with the aim to reduce the spherical aberration without introducing diffraction effects. A brief summary of this work together with a description of results obtained recently, will be given.The concept of utilizing a crystal as aperture in an electron optical system was introduced by Fourie who employed a {111} crystal foil as a collector aperture, by mounting the sample directly on top of the foil and in intimate contact with the foil. In the present work the sample was mounted on the bottom of the foil so that the crystal would function as an objective or probe forming aperture. The transmission function of such a crystal aperture depends on the thickness, t, and the orientation of the foil. The expression for calculating the transmission function was derived by Hashimoto, Howie and Whelan on the basis of the electron equivalent of the Borrmann anomalous absorption effect in crystals. In Fig. 1 the functions for a g220 diffraction vector and t = 0.53 and 1.0 μm are shown. Here n= Θ‒ΘB, where Θ is the angle between the incident ray and the (hkl) planes, and ΘB is the Bragg angle.

Download Full-text