Atomic force microscopy and lateral force microscopy using piezoresistive cantilevers

Author(s):  
R. Linnemann
2021 ◽  
Vol 12 ◽  
pp. 517-524
Author(s):  
Oliver Gretz ◽  
Alfred J Weymouth ◽  
Thomas Holzmann ◽  
Korbinian Pürckhauer ◽  
Franz J Giessibl

In lateral force microscopy (LFM), implemented as frequency-modulation atomic force microscopy, the tip oscillates parallel to the surface. Existing amplitude calibration methods are not applicable for mechanically excited LFM sensors at low temperature. Moreover, a slight angular offset of the oscillation direction (tilt) has a significant influence on the acquired data. To determine the amplitude and tilt we make use of the scanning tunneling microscopy (STM) channel and acquire data without and with oscillation of the tip above a local surface feature. We use a full two-dimensional current map of the STM data without oscillation to simulate data for a given amplitude and tilt. Finally, the amplitude and tilt are determined by fitting the simulation output to the data with oscillation.


1998 ◽  
Vol 543 ◽  
Author(s):  
V. Pasquier ◽  
J. M. Drake

AbstractLateral Force Microscopy offers the possibility of exploring tribological properties of interfaces atthe nanoscale. Our research focused on some crucial conditions that must be fuffilled to obtainquantitative and reliable LFM friction measurements. We have characterized the mechanical andvibrational properties of the cantilever. Precise force calibration were made based on ourknowledge of the intrinsic coupling modes of the cantilever. We report measurements of the slidingfriction between two silica surfaces. The load dependence of the friction force was analyzedassuming different models for the contact, from Hertzian to Amontons law.


1999 ◽  
Vol 14 (9) ◽  
pp. 3695-3706 ◽  
Author(s):  
David J. Stein ◽  
Joseph L. Cecchi ◽  
Dale L. Hetherington

We investigated various interactions between alumina and tungsten films that occur during chemical mechanical polishing (CMP). Atomic force microscopy surface topography measurements of post-CMP tungsten indicate that the roughness of the tungsten is independent of polish pressure and rotation rate. Pure mechanical abrasion is therefore an unlikely mechanism of material removal during CMP. Transmission electron microscopy images corroborate these results. The adhesion force between alumina and tungsten was measured in solution. The adhesive force increased with KIO3 concentration. Friction forces were measured in solution using lateral force microscopy. The friction force in buffered solutions was independent of KIO3 concentration. These results indicate that interactions other than purely mechanical interactions exist during CMP.


2018 ◽  
Vol 184 ◽  
pp. 199-208 ◽  
Author(s):  
P. Biczysko ◽  
A. Dzierka ◽  
G. Jóźwiak ◽  
M. Rudek ◽  
T. Gotszalk ◽  
...  

2020 ◽  
Vol 68 (4) ◽  
Author(s):  
Arnab Bhattacharjee ◽  
Nikolay T. Garabedian ◽  
Christopher L. Evans ◽  
David L. Burris

1999 ◽  
Vol 38 (Part 1, No. 6B) ◽  
pp. 3958-3961 ◽  
Author(s):  
Masami Kageshima ◽  
Hisato Ogiso ◽  
Shizuka Nakano ◽  
Mark A. Lantz ◽  
Hiroshi Tokumoto

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