Low resistivity Al–RE (RE=La, Pr, and Nd) alloy thin films with high thermal stability for thin-film-transistor interconnects
1996 ◽
Vol 14
(5)
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pp. 3257
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1996 ◽
Vol 289
(1-2)
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pp. 289-294
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2016 ◽
Vol 63
(11)
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pp. 4320-4325
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2011 ◽
Vol 550
(1)
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pp. 13-22
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2019 ◽
Vol 45
(9)
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pp. 11749-11755
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2020 ◽
Vol 124
(49)
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pp. 26780-26792
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