Single-crystal epitaxial Ge-based ohmic contact structure for III–V nanoelectronic and mesoscopic devices

Author(s):  
M. Dubey
2015 ◽  
Vol 59 ◽  
pp. 90-94 ◽  
Author(s):  
W. Wang ◽  
C. Hu ◽  
F.N. Li ◽  
S.Y. Li ◽  
Z.C. Liu ◽  
...  

2020 ◽  
Vol 8 (1) ◽  
pp. 276-284 ◽  
Author(s):  
Yangyang Dang ◽  
Guoqing Tong ◽  
Wentao Song ◽  
Zonghao Liu ◽  
Longbin Qiu ◽  
...  

Cs2AgBiBr6 single crystal photodetectors using Ag electrodes under different wavelength at room condition showed the excellent photo-response with Ohmic-contact among the different electrodes (Au, Ag and Al).


Coatings ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 876
Author(s):  
Pengfei Zhang ◽  
Shaopeng Zhang ◽  
Weidong Chen ◽  
Shufang Yan ◽  
Wen Ma ◽  
...  

Ohmic contact of nickel on hydrogen-terminated single-crystal diamond film was investigated with an annealing temperature ranging from room temperature to 750 °C in hydrogen atmosphere. Nickel film was deposited on a hydrogen-terminated single-crystal diamond surface with gold film in order to protect it from oxidation. Contact properties between nickel and hydrogen-terminated single crystal diamond were measured by a circular transmission line model. The lowest specific contact resistivity was 7.82 × 10−5 Ω cm2 at annealing temperature of 750 °C, indicating good ohmic contact, which reveals improved thermal stability by increasing temperature.


2017 ◽  
Vol 7 (1) ◽  
Author(s):  
Yan-Feng Wang ◽  
Xiaohui Chang ◽  
Shuoye Li ◽  
Dan Zhao ◽  
Guoqing Shao ◽  
...  

2018 ◽  
Vol 63 (8) ◽  
pp. 1177-1181 ◽  
Author(s):  
A. V. Malevskaya ◽  
V. S. Kalinovskii ◽  
N. D. Il’inskaya ◽  
D. A. Malevskii ◽  
E. V. Kontrosh ◽  
...  

2011 ◽  
Vol 23 (15) ◽  
pp. 1037-1039 ◽  
Author(s):  
Yi-Jung Liu ◽  
Chien-Chang Huang ◽  
Tai-You Chen ◽  
Chi-Shiang Hsu ◽  
Tsung-Yuan Tsai ◽  
...  

2011 ◽  
Vol 19 (15) ◽  
pp. 14662 ◽  
Author(s):  
Yi-Jung Liu ◽  
Chien-Chang Huang ◽  
Tai-You Chen ◽  
Chi-Shiang Hsu ◽  
Jian-Kai Liou ◽  
...  

Nanomaterials ◽  
2018 ◽  
Vol 8 (12) ◽  
pp. 1060 ◽  
Author(s):  
Jiaqi Zhang ◽  
Yi Zhang ◽  
Dazheng Chen ◽  
Weidong Zhu ◽  
He Xi ◽  
...  

Bendable single crystal silicon nanomembrane thin film transistors (SiNMs TFTs), employing a simple method which can improve the metal/n-Silicon (Si) contact characteristics by inserting the titanium dioxide (TiO2) interlayer deposited by atomic layer deposition (ALD) at a low temperature (90 °C), are fabricated on ITO/PET flexible substrates. Current-voltage characteristics of titanium (Ti)/insertion layer (IL)/n-Si structures demonstrates that they are typically ohmic contacts. X-ray photoelectron spectroscopy (XPS) results determines that TiO2 is oxygen-vacancies rich, which may dope TiO2 and contribute to a lower resistance. By inserting TiO2 between Ti and n-Si, Ids of bendable single crystal SiNMs TFTs increases 3–10 times than those without the TiO2 insertion layer. The fabricated bendable devices show superior flexible properties. The TFTs, whose electrical properties keeps almost unchanged in 800 cycles bending with a bending radius of 0.75 cm, obtains the durability in bending test. All of the results confirm that it is a promising method to insert the TiO2 interlayer for improving the Metal/n-Si ohmic contact in fabrication of bendable single crystal SiNMs TFTs.


Sign in / Sign up

Export Citation Format

Share Document