In situ thickness monitoring and control for highly reproducible growth of distributed Bragg reflectors

Author(s):  
Y. M. Houng
2022 ◽  
Vol 43 (3) ◽  
Author(s):  
Jonathan Pearce ◽  
Declan Tucker ◽  
Carmen García Izquierdo ◽  
Raul Caballero ◽  
Trevor Ford ◽  
...  

AbstractMineral insulated, metal sheathed (MI) Type K and Type N thermocouples are widely used in industry for process monitoring and control. One factor that limits their accuracy is the dramatic decrease in the insulation resistance at temperatures above about 600 °C which results in temperature measurement errors due to electrical shunting. In this work the insulation resistance of a cohort of representative MI thermocouples was characterised at temperatures up to 1160 °C, with simultaneous measurements of the error in indicated temperature by in situ comparison with a reference Type R thermocouple. Intriguingly, there appears to be a systematic relationship between the insulation resistance and the error in the indicated temperature. At a given temperature, as the insulation resistance decreases, there is a corresponding increasingly negative error in the temperature measurement. Although the measurements have a relatively large uncertainty (up to about 1 °C in temperature error and up to about 10 % in insulation resistance measurement), the trend is apparent at all temperatures above 600 °C, which suggests that it is real. Furthermore, the correlation disappears at temperatures below about 600 °C, which is consistent with the well-established diminution of insulation resistance breakdown effects below that temperature. This raises the intriguing possibility of using the as-new MI thermocouple calibration as an indicator of insulation resistance breakdown: large deviations of the electromotive force (emf) in the negative direction could indicate a correspondingly low insulation resistance.


1997 ◽  
Vol 44 (1-3) ◽  
pp. 134-138 ◽  
Author(s):  
Blaine Johs ◽  
Craig Herzinger ◽  
Ping He ◽  
Shakil Pittal ◽  
John Woollam ◽  
...  

1997 ◽  
Vol 26 (10) ◽  
pp. 1145-1153 ◽  
Author(s):  
A. Kussmaul ◽  
S. Vernon ◽  
P. C. Colter ◽  
R. Sudharsanan ◽  
A. Mastrovito ◽  
...  

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