Low stress and optically transparent chromium oxide layer for x-ray mask making

Author(s):  
Jutta Trube
2019 ◽  
Vol 492 ◽  
pp. 280-284
Author(s):  
Naoya Miyauchi ◽  
Tomoya Iwasawa ◽  
Taro Yakabe ◽  
Masahiro Tosa ◽  
Toyohiko Shindo ◽  
...  

2018 ◽  
Vol 61 (10) ◽  
pp. 675-680 ◽  
Author(s):  
A.N. ITAKURA ◽  
M. TOSA ◽  
T. YAKABE ◽  
N. MIYAUCHI ◽  
A. KASAHARA ◽  
...  

2011 ◽  
Vol 60 (4) ◽  
pp. 1499-1502 ◽  
Author(s):  
Yohei Ozeki ◽  
Yuji Hatano ◽  
Haruka Taniguchi ◽  
Masao Matsuyama

Author(s):  
Jonathan Leon ◽  
Sven Pletincx ◽  
Herman Terryn ◽  
Berkem Özkaya ◽  
Eva García-Lecina ◽  
...  

Abstract A model trivalent chromium-based electroplating bath doped with different concentration of Fe was used to obtain the different metallic coatings. The impact of the Fe was investigated on the Cr layer and on its native passive film by a detailed characterisation using X-ray Photoelectron Spectroscopy (XPS), Angle Resolved XPS and Auger Electron Spectroscopy. Moreover, the semiconducting properties of their oxide layers were explored by Mott-Schottky and the corrosion performance by the linear polarisation resistance and kinetics of the oxide formation. Results revealed not only a homogeneous Fe distribution into the Cr layer but also the presence of an iron-chromium duplex oxide layer for concentrations ≥ 100 mg/L Fe in the bath. The Mott-Schottky analysis showed a p-n junction for such coatings due to the presence of an iron oxide layer on the top of a chromium oxide one which increases the total amount of point defects (charge carrier density) and drastically affects their corrosion resistance (the polarisation resistance decreased by one order of magnitude and their oxide layer showed slower kinetics and a higher passivation current). In contrast, coatings with a single chromium oxide layer showed a p-type semiconducting behaviour as well as the best corrosion performance.


2005 ◽  
Vol 879 ◽  
Author(s):  
Scott K. Stanley ◽  
John G. Ekerdt

AbstractGe is deposited on HfO2 surfaces by chemical vapor deposition (CVD) with GeH4. 0.7-1.0 ML GeHx (x = 0-3) is deposited by thermally cracking GeH4 on a hot tungsten filament. Ge oxidation and bonding are studied at 300-1000 K with X-ray photoelectron spectroscopy (XPS). Ge, GeH, GeO, and GeO2 desorption are measured with temperature programmed desorption (TPD) at 400-1000 K. Ge initially reacts with the dielectric forming an oxide layer followed by Ge deposition and formation of nanocrystals in CVD at 870 K. 0.7-1.0 ML GeHx deposited by cracking rapidly forms a contacting oxide layer on HfO2 that is stable from 300-800 K. Ge is fully removed from the HfO2 surface after annealing to 1000 K. These results help explain the stability of Ge nanocrystals in contact with HfO2.


2017 ◽  
Vol 1 (21) ◽  
pp. 65-73
Author(s):  
Monika Gwoździk

The paper presents results of studies on the crystallite sizes of oxide layer formed during a long-term operation on 10CrMo9-10 steel at an elevated temperature (T = 545° C, t = 200,000 h). This value was determined by a method based on analysis of the diffraction line profile, according to a Scherrer formula. The oxide layer was studied on a surface and a cross-section at the outer and inner site on the pipe outlet, at the fire and counter-fire wall of the tube. X-ray studies were carried out on the surface of a tube, then the layer’s surface was polished and the diffraction measurements repeated to reveal differences in the originated oxides layer.


1989 ◽  
Vol 9 (1-4) ◽  
pp. 147-150 ◽  
Author(s):  
M. Gentili ◽  
A. Lucchesini ◽  
P. Lugli ◽  
G. Messina ◽  
A. Paoletti ◽  
...  

Materials ◽  
2021 ◽  
Vol 14 (3) ◽  
pp. 526
Author(s):  
Zhengyuan Li ◽  
Lijia Chen ◽  
Haoyu Zhang ◽  
Siyu Liu

The oxidation behavior and microstructural evolution of the nanostructure of Fe-Cr-Al oxide dispersion strengthened (ODS) alloys prepared by spark plasma sintering were investigated by high-temperature oxidation experiments in air at 1200 °C for 100 h. The formation of Al2O3 scale was observed by X-ray diffraction (XRD) and scanning electron microscopy (SEM) with energy-dispersive X-ray spectroscopy (EDS) line scans. The oxidation rate of Fe-Cr-Al ODS alloys is lower than that of conventional Fe-Cr-Al alloys, and the oxide layer formed on the Fe-Cr-Al alloy appeared loose and cracked, whereas the oxide layer formed on the Fe-Cr-Al ODS alloys was adherent and flat. This is due to the high density of dispersed nano-oxides hindering the diffusion of Al element and the formation of vacancies caused by them. In addition, the nano-oxides could also adhere to the oxide layer. Besides, the microstructure of the Fe-Cr-Al ODS alloy had excellent stability during high-temperature oxidation.


Sign in / Sign up

Export Citation Format

Share Document