A low cost deep-ultraviolet (UV) light source for bilevel resist applications

1987 ◽  
Vol 5 (3) ◽  
pp. 671
Author(s):  
A. L. Powell
Keyword(s):  
Light Source ◽  
Uv Light ◽  
Low Cost ◽  
Deep Ultraviolet

scholarly journals Low-cost photolithography system for cell biology labs

2021 ◽  
Vol 7 (2) ◽  
pp. 550-553
Author(s):  
Benjamin K. Naggay ◽  
Kerstin Frey ◽  
Markus Schneider ◽  
Kiriaki Athanasopulu ◽  
Günter Lorenz ◽  
...  
Keyword(s):  
Light Source ◽  
Cell Biology ◽  
Soft Lithography ◽  
Uv Light ◽  
Low Cost ◽  
Cost Effective ◽  
Working Environment ◽  
Light Emitting ◽  
Set Up ◽  
High Level

Abstract Soft lithography, a tool widely applied in biology and life sciences with numerous applications, uses the soft molding of photolithography-generated master structures by polymers. The central part of a photolithography set-up is a mask-aligner mostly based on a high-pressure mercury lamp as an ultraviolet (UV) light source. This type of light source requires a high level of maintenance and shows a decreasing intensity over its lifetime, influencing the lithography outcome. In this paper, we present a low-cost, bench-top photolithography tool based on ninety-eight 375 nm light-emitting diodes (LEDs). With approx. 10 W, our presented lithography set-up requires only a fraction of the energy of a conventional lamp, the LEDs have a guaranteed lifetime of 1000 h, which becomes noticeable by at least 2.5 to 15 times more exposure cycles compared to a standard light source and with costs less than 850 C it is very affordable. Such a set-up is not only attractive to small academic and industrial fabrication facilities who want to enable work with the technology of photolithography and cannot afford a conventional set-up, but also microfluidic teaching laboratories and microfluidic research and development laboratories, in general, could benefit from this cost-effective alternative. With our self-built photolithography system, we were able to produce structures from 6 μm to 50 μm in height and 10 μm to 200 μm in width. As an optional feature, we present a scaled-down laminar flow hood to enable a dust-free working environment for the photolithography process.

A graphene oxide-based fluorescent sensor for surfactants

2019 ◽  
Vol 11 (45) ◽  
pp. 5826-5832
Author(s):  
Govindaraj Usha ◽  
Ramesh Prakash ◽  
Karuppasamy Karpagalakshmi ◽  
Sundaram Ramalakshmi ◽  
Lakshminarayanan Piramuthu ◽  
...  
Keyword(s):  
Graphene Oxide ◽  
Light Source ◽  
Rhodamine B ◽  
Visual Detection ◽  
Detection Method ◽  
Fluorescent Sensor ◽  
Uv Light ◽  
Low Cost

A facile and low-cost detection method for the surfactants of ionic and non-ionic types was successfully demonstrated using rhodamine B-decorated graphene oxide, which also helped the visual detection of surfactants under a UV light source.

A low-cost low-maintenance ultraviolet lithography light source based on light-emitting diodes

Lab on a Chip ◽  
2015 ◽  
Vol 15 (1) ◽  
pp. 57-61 ◽  
Author(s):  
M. Erickstad ◽  
E. Gutierrez ◽  
A. Groisman
Keyword(s):  
Light Source ◽  
Light Emitting Diodes ◽  
Uv Light ◽  
Low Cost ◽  
Uniform Illumination ◽  
Large Area ◽  
Ultraviolet Lithography ◽  
Light Emitting

An LED-based UV-light source producing collimated uniform illumination over a large area is built and used to fabricate PDMS microchannels with near-rectangular profiles and depths up to 300 μm.

Development of a UV Light Source using Pr:LuAG Thin Film Target Pumped by Electron Beam

2015 ◽  
Vol 135 (9) ◽  
pp. 1049-1054
Author(s):  
Norio Ichikawa ◽  
Kohei Ikeda ◽  
Yoshinori Honda ◽  
Hiroyuki Taketomi ◽  
Koji Kawai ◽  
...  
Keyword(s):  
Thin Film ◽  
Electron Beam ◽  
Light Source ◽  
Uv Light

A low-cost and portable device for measuring spectrum of light source as a stimulus for the human’s circadian system

2021 ◽  
Vol 252 ◽  
pp. 111386
Author(s):  
Armin Amirazar ◽  
Mona Azarbayjani ◽  
Maziyar Molavi ◽  
Morteza Karami
Keyword(s):  
Light Source ◽  
Low Cost ◽  
Circadian System ◽  
Portable Device

A Large Emitting Area UV Light Source With Semiconductor Cathode

2004 ◽  
Vol 32 (5) ◽  
pp. 2093-2098 ◽  
Author(s):  
B.G. Salamov ◽  
Y. OztekinCiftci ◽  
K. Colakoglu
Keyword(s):  
Light Source ◽  
Uv Light

Mechanical Characterization of UV Photopolymerized PMMA with Different Photo-Initiator Concentration

2021 ◽  
Vol 903 ◽  
pp. 11-16
Author(s):  
M.A. Manjunath ◽  
K. Naveen ◽  
Prakash Vinod ◽  
N. Balashanmugam ◽  
M.R. Shankar
Keyword(s):  
Mechanical Properties ◽  
Light Source ◽  
Polymethyl Methacrylate ◽  
Biomedical Applications ◽  
Mechanical Characterization ◽  
Uv Light ◽  
Curing Time ◽  
Uv Led ◽  
Pmma Resin

Polymethyl methacrylate (PMMA) is one among few known photo-polymeric resin useful in lithography for fabricating structures having better mechanical properties to meet the requirement in electronics and biomedical applications. This study explores the effect of Photo Initiator (PI) concentration and also curing time on strength and hardness of Polymethyl methacrylate (PMMA) obtained by UV photopolymerization of Methyl methacrylate (MMA) monomer. The UV LED light source operating at the wavelength of 364 nm is used with Benzoin Ethyl Ether (BEE) as photo initiator. The curing of PMMA resin is supported with peltier cooling device placed at the bottom of the UV light source. The characterisation study of UV photo cured PMMA is analysed through nano indenter (Agilent Technologies-G200). The current work investigates the influence of PI concentration and curing time in achieving maximum mechanical properties for UV photopolymerized PMMA.

A Very Low-Cost, Labor-Efficient, and Simple Method to Block Scattered Ultraviolet Light in PDMS Microfluidic Devices by Inserting Aluminum Foil Strips

2018 ◽  
Vol 11 (1) ◽  
Author(s):  
Shuo Wang ◽  
Peter Shankles ◽  
Scott Retterer ◽  
Yong Tae Kang ◽  
Chang Kyoung Choi
Keyword(s):  
Soft Lithography ◽  
Uv Light ◽  
Low Cost ◽  
Microfluidic Devices ◽  
Aluminum Foil ◽  
Material Synthesis ◽  
Simple Method ◽  
Micro Particles ◽  
Complex Shapes ◽  
The Cost

Abstract Opto-microfluidic methods have advantages for manufacturing complex shapes or structures of micro particles/hydrogels. Most of these microfluidic devices are made of polydimethylsiloxane (PDMS) by soft lithography because of its flexibility of designing and manufacturing. However, PDMS scatters ultraviolet (UV) light, which polymerizes the photocrosslinkable materials at undesirable locations and clogs the microfluidic devices. A fluorescent dye has previously been employed to absorb the scattered UV light and shift its wavelength to effectively solve this issue. However, this method is limited due to the cost of the materials (tens of dollars per microchip), the time consumed on synthesizing the fluorescent material and verifying its quality (two to three days). More importantly, significant expertise on material synthesis and characterization is required for users of the opto-microfluidic technique. The cost of preliminary testing on multiple iterations of different microfluidic chip designs would also be excessive. Alternatively, with a delicate microchannel design, we simply inserted aluminum foil strips (AFS) inside the PDMS device to block the scattered UV light. By using this method, the UV light was limited to the exposure region so that the opto-microfluidic device could consistently generate microgels longer than 6 h. This is a nearly cost- and labor-free method to solve this issue.

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