On the active surface layer in CF3+ etching of Si: Atomistic simulation and a simple mass balance model
2000 ◽
Vol 18
(2)
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pp. 411-416
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Keyword(s):
2007 ◽
Vol 149
(3)
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pp. 315-326
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Keyword(s):
2018 ◽
Vol 20
(8)
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pp. 1158-1166
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Keyword(s):
2004 ◽
Vol 37
(19)
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pp. 283-288
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Keyword(s):
2012 ◽
Vol 246
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pp. 105-118
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2012 ◽
Vol 45
(16)
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pp. 1442-1447
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Keyword(s):
2000 ◽
Vol 45
(6)
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pp. 817-832
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