Electrical properties of (Pb,La)TiO3 thin films deposited by low pressure metal-organic chemical vapor deposition using solid delivery system

1998 ◽  
Vol 16 (4) ◽  
pp. 2591-2594 ◽  
Author(s):  
Ju Cheol Shin ◽  
Jong Myeong Lee ◽  
Suk-Kyoung Hong ◽  
Ho Jin Cho ◽  
Kwon Seok Kim ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Electrical Properties ◽  
Delivery System ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Preparation of semiconductive SrTiO3 thin films by metal-organic chemical vapor deposition and their electrical properties

1997 ◽  
Vol 12 (6) ◽  
pp. 1655-1660 ◽  
Author(s):  
Daisuk Nagano ◽  
Hiroshi Funakubo ◽  
Osamu Sakurai ◽  
Kazuo Shinozaki ◽  
Nobuyasu Mizutani
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Electrical Properties ◽  
Vapor Deposition ◽  
Heating Temperature ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Treatment Conditions ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Insulating epitaxially grown SrTiO3 thin films were prepared on (100)MgO substrates by metal-organic chemical vapor deposition (MOCVD). Semiconductive SrTiO3 thin films were obtained by the rapid cooling after reheating in reduction atmosphere. The microstructure, crystal structure, and electrical properties of these films were investigated. The electrical properties varied by the composition of films and heat-treatment conditions, i.e., the heating temperature, the oxygen partial pressure, and the cooling rate after the annealing. Change of the resistivity of the film was attributed to that of the carrier concentration. Mobility of films was unchanged, and the value was almost the same order of that of bulks. The lowest resistivity of 0.1 Ω·cm was obtained when a sample of Ti/Sr = 1.0 was heated at 1200 °C under 10−15 Pa of PO2 and then rapidly cooled. This value is similar to that of bulks (100 –10−1 Ω · cm).

Transparent conducting indium oxide thin films grown by low-temperature metal organic chemical vapor deposition

2007 ◽  
Vol 515 (5) ◽  
pp. 2921-2925 ◽  
Author(s):  
Chunyu Wang ◽  
Volker Cimalla ◽  
Genady Cherkashinin ◽  
Henry Romanus ◽  
Majdeddin Ali ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Indium Oxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Transparent Conducting ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition
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