Silicon surfaces treated by CF4, CF4/H2, and CF4/O2 rf plasmas: Study by in situ Fourier transform infrared ellipsometry
1997 ◽
Vol 15
(2)
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pp. 209-215
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Keyword(s):
1998 ◽
Vol 37
(Part 1, No. 8)
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pp. 4522-4526
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2016 ◽
2021 ◽
Vol 10
◽
pp. 15-23
Keyword(s):
2009 ◽
Vol 9
(2)
◽
pp. 1483-1486
1996 ◽
Vol 67
(4)
◽
pp. 1454-1457
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1986 ◽
Vol 201
(2)
◽
pp. 413-421
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Keyword(s):
2003 ◽
Vol 497
(1-2)
◽
pp. 155-164
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1989 ◽
Vol 7
(1)
◽
pp. 35
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