Etch‐stop characteristics of Sc2O3 and HfO2 films for multilayer dielectric grating applications

1996 ◽  
Vol 14 (5) ◽  
pp. 2973-2975 ◽  
Author(s):  
J. A. Britten ◽  
H. T. Nguyen ◽  
S. F. Falabella ◽  
B. W. Shore ◽  
M. D. Perry ◽  
...  
Keyword(s):  
Dielectric Grating ◽  
Etch Stop ◽  
Multilayer Dielectric

A Novel Batch Production Technique of Metal Embedded Thin Film Microsensors for Applications in Manufacturing

2005 ◽  
Author(s):  
Arindom Datta ◽  
Hongseok Choi ◽  
Xiaochun Li
Keyword(s):  
Thin Film ◽  
Silicon Wafer ◽  
Strain Gauge ◽  
Metal Layer ◽  
Nitride Layer ◽  
Nickel Layer ◽  
Layer Deposition ◽  
Etch Stop ◽  
Etch Stop Layer ◽  
Multilayer Dielectric

Effective monitoring and diagnosis of manufacturing processes is of importance in reducing operation costs, improving product quality, and reducing process time. If conditions of manufacturing tools are continuously monitored, problems can be detected and solved during the processing cycle, resulting in less tool damage, higher productivity, and less energy consumption. In-situ monitoring of the basic operating conditions (e.g. temperature and strain) of certain mechanical tools and components can be accomplished by placing microsensors in some critical locations. Thin film microsensors (e.g. thermocouple, strain gauge) have drawn considerable attention recently due to their small size, fast response and lower cost [1]. Since most tools and components in manufacturing process are metallic, metal embedded thin film microsensors are very attractive. A new batch fabrication technique based on electroplating and wet chemical etching of silicon has been developed. Microsensors were directly fabricated on an etch stop layer grown on silicon wafer. A multilayer dielectric is deposited to insulate sensor areas followed by seed layer deposition, and electroplating a thicker metal layer. After silicon wafer is etched out, the microsensors are transferred from silicon to electroplated metal substrate directly. After plasma etching of the etch stop layer, these sensors can be further embedded into another electroplated metal layer from the top after insulation by dielectric multilayer. Metal embedded strain gauge array was fabricated successfully. Thin film Ni/Cr strain gauges were fabricated on LPCVD silicon nitride layer grown on a 3-inch silicon wafer. Each strain gauge unit was insulated by Al2O3/PECVD SixNy/Al2O3 multilayer before seed layer deposition and electroplating a thick nickel layer on whole wafer. Si wafer was then etched out in KOH solution to transfer all microsensors to electroplated nickel layer. LPCVD nitride layer covering the sensors was dry etched and same multilayer dielectric was selectively deposited over the sensors except pad areas. These microsensors were finally embedded into another electroplated nickel layer leaving the pads uncovered for external connection. This process offers a novel way to realize batch production of metal embedded microsensors for use in hostile manufacturing environment.

Effective dispersion compensation of variable-linewidth fiber amplifier by single-multilayer dielectric grating

2016 ◽  
Vol 18 (6) ◽  
pp. 065610 ◽  
Author(s):  
Ye Zheng ◽  
Yifeng Yang ◽  
Jianhua Wang ◽  
Man Hu ◽  
Guangbo Liu ◽  
...  
Keyword(s):  
Dispersion Compensation ◽  
Fiber Amplifier ◽  
Dielectric Grating ◽  
Effective Dispersion ◽  
Multilayer Dielectric

Multilayer dielectric grating for large deviation using angle

Optik ◽  
2013 ◽  
Vol 124 (6) ◽  
pp. 561-563
Author(s):  
Jianyong Ma ◽  
Jianpeng Wang
Keyword(s):  
Large Deviation ◽  
Dielectric Grating ◽  
Multilayer Dielectric

Broadband trapeziform multilayer dielectric grating for femtosecond pulse compressor: design, fabrication, and analysis

Laser Physics ◽  
2013 ◽  
Vol 23 (11) ◽  
pp. 115301 ◽  
Author(s):  
Heyuan Guan ◽  
Yunxia Jin ◽  
Shijie Liu ◽  
Fanyu Kong ◽  
Ying Du ◽  
...  
Keyword(s):  
Femtosecond Pulse ◽  
Pulse Compressor ◽  
Dielectric Grating ◽  
Compressor Design ◽  
Multilayer Dielectric

scholarly journals Performance of multilayer dielectric grating irradiated by ultrashort optical pulse

2007 ◽  
Vol 56 (8) ◽  
pp. 4542
Author(s):  
Liu Shi-Jie ◽  
Ma Jian-Yong ◽  
Shen Zi-Cai ◽  
Kong Wei-Jin ◽  
Shen Jian ◽  
...  
Keyword(s):  
Optical Pulse ◽  
Ultrashort Optical Pulse ◽  
Dielectric Grating ◽  
Multilayer Dielectric

Design of shallow-etched multilayer dielectric grating with –1st order high diffraction efficiency

2010 ◽  
Vol 8 (S1) ◽  
pp. 29-31
Author(s):  
汪剑鹏 Jianpeng Wang ◽  
晋云霞 Yunxia Jin ◽  
刘世杰 Shijie Liu ◽  
邵建达 Jianda Shao ◽  
范正修 Zhengxiu Fan
Keyword(s):  
Diffraction Efficiency ◽  
Dielectric Grating ◽  
High Diffraction Efficiency ◽  
High Diffraction ◽  
Multilayer Dielectric

Analysis of restriction factors of widening diffraction bandwidth of multilayer dielectric grating

2010 ◽  
Vol 19 (10) ◽  
pp. 104201 ◽  
Author(s):  
Wang Jian-Peng ◽  
Jin Yun-Xia ◽  
Ma Jian-Yong ◽  
Shao Jian-Da ◽  
Fan Zheng-Xiu
Keyword(s):  
Restriction Factors ◽  
Dielectric Grating ◽  
Multilayer Dielectric

Characteristics of high reflection mirror with an SiO2top layer for multilayer dielectric grating

2007 ◽  
Vol 40 (10) ◽  
pp. 3224-3228 ◽  
Author(s):  
Shijie Liu ◽  
Yunxia Jin ◽  
Yun Cui ◽  
Jianyong Ma ◽  
Jianda Shao ◽  
...  
Keyword(s):  
Dielectric Grating ◽  
High Reflection ◽  
Multilayer Dielectric
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