Faceting of the Mo(111) surface by ultrathin Pd and Pt films

1995 ◽  
Vol 13 (3) ◽  
pp. 1484-1488 ◽  
Author(s):  
Jie Guan ◽  
Robert A. Campbell ◽  
Theodore E. Madey
Keyword(s):  
Pt Films

Surface Microstructure Evolution Upon Silicidation of Ni(Pt) and the Different Responses to Metal Etch

2013 ◽  
Author(s):  
Wentao Qin ◽  
Dorai Iyer ◽  
Jim Morgan ◽  
Carroll Casteel ◽  
Robert Watkins ◽  
...  
Keyword(s):  
Thin Film ◽  
Oxide Film ◽  
Microstructure Evolution ◽  
Depth Profiling ◽  
Surface Microstructure ◽  
The Difference ◽  
Surface Microstructures ◽  
Pt Films

Abstract Ni(5 at.%Pt ) films were silicided at a temperature below 400 °C and at 550 °C. The two silicidation temperatures had produced different responses to the subsequent metal etch. Catastrophic removal of the silicide was seen with the low silicidation temperature, while the desired etch selectivity was achieved with the high silicidation temperature. The surface microstructures developed were characterized with TEM and Auger depth profiling. The data correlate with both silicidation temperatures and ultimately the difference in the response to the metal etch. With the high silicidation temperature, there existed a thin Si-oxide film that was close to the surface and embedded with particles which contain metals. This thin film is expected to contribute significantly to the desired etch selectivity. The formation of this layer is interpreted thermodynamically.

Analysis on Resistance Change Mechanism of NiO-ReRAM Using Visualization Technique of Data Storage Area With Secondary Electron Image

2010 ◽  
Vol 1250 ◽  
Author(s):  
Kentaro Kinoshita ◽  
Tatsuya Makino ◽  
Yoda Takatoshi ◽  
Dobashi Kazufumi ◽  
Kishida Satoru
Keyword(s):  
Data Storage ◽  
Secondary Electron ◽  
High Resistance State ◽  
Secondary Electron Image ◽  
Resistance Change ◽  
Force Microscopy ◽  
Electron Image ◽  
Storage Area ◽  
Resistance State ◽  
Pt Films

AbstractBoth a low resistance state and a high resistance state which were written by the voltage application in a local region of NiO/Pt films by using conducting atomic force microscopy (C-AFM) were observed by using scanning electron microscope (SEM) and electron probe micro analysis (EPMA). The writing regions are distinguishable as dark areas in a secondary electron image and thus can be specified without using complicated sample fabrication process to narrow down the writing regions such as the photolithography technique. In addition, the writing regions were analyzed by using energy dispersive X-ray spectroscopy (EDS) mapping. No difference between the inside and outside of the writing regions is observed for all the mapped elements including C and Rh. Here, C and Rh are the most probable candidates for contamination which affect the secondary electron image. Therefore, our results suggested that the observed change in the contrast of the second electron image is related to the intrinsic change in the electronic state of the NiO film and a secondary electron yield is correlated to the physical properties of the film.

Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches

2017 ◽  
Vol 146 (5) ◽  
pp. 052818 ◽  
Author(s):  
I. J. M. Erkens ◽  
M. A. Verheijen ◽  
H. C. M. Knoops ◽  
W. Keuning ◽  
F. Roozeboom ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
Atomic Layer Deposition ◽  
High Aspect Ratio ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Pt Films

Thickness effects on the magnetic hysteresis of Co-Pt films

1993 ◽  
Vol 118 (3) ◽  
pp. 387-393 ◽  
Author(s):  
A. Tsoukatos ◽  
H. Wan ◽  
G.C. Hadjipanayis ◽  
Y.J. Zhang ◽  
M. Waite ◽  
...  
Keyword(s):  
Magnetic Hysteresis ◽  
Pt Films

Electrodeposition and hard magnetic properties of Co–Pt films in comparison to Fe–Pt films

2007 ◽  
Vol 314 (2) ◽  
pp. 116-121 ◽  
Author(s):  
K. Žužek Rožman ◽  
A. Krause ◽  
K. Leistner ◽  
S. Fähler ◽  
L. Schultz ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Pt Films ◽  
Hard Magnetic Properties

scholarly journals Thermally driven spin and charge currents in thin NiFe2O4/Pt films

2013 ◽  
Vol 87 (5) ◽  
Author(s):  
D. Meier ◽  
T. Kuschel ◽  
L. Shen ◽  
A. Gupta ◽  
T. Kikkawa ◽  
...  
Keyword(s):  
Thermally Driven ◽  
Pt Films

Microstructure and magnetic properties of oxidized Fe-Pt films with high rate order-disorder transformation

2001 ◽  
Vol 37 (4) ◽  
pp. 1312-1314 ◽  
Author(s):  
Kyung-Hwan Na ◽  
Jong-Gab Na ◽  
Hi-Jung Kim ◽  
Pyung-Woo Jang ◽  
Jong-Ryoul Kim ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
High Rate ◽  
Pt Films ◽  
Microstructure And Magnetic Properties

Texture-indduced magnetic anistotrophy of Co-Pt films

1989 ◽  
Author(s):  
R. Nishikawa ◽  
T. Hikosaka ◽  
K. Igarashi ◽  
M. Kanamaru
Keyword(s):  
Pt Films

scholarly journals Влияние толщины пленки Pt на изменение текстуры и доли кристаллической фазы при ее отжиге

2020 ◽  
Vol 90 (5) ◽  
pp. 795
Author(s):  
Р.В. Селюков ◽  
В.В. Наумов
Keyword(s):  
Volume Fraction ◽  
Curve Analysis ◽  
X Ray Diffraction ◽  
Rocking Curve ◽  
X Ray ◽  
Texture Parameters ◽  
Sputter Deposited ◽  
Pt Films ◽  
H 20

Textured Pt films with thickness h=20-80 nm were sputter deposited on oxidized c-Si (100) wafers and annealed in vacuum at 500°C/60 min. The thickness dependencies of the crystalline texture parameters and of the fraction of crystalline phase δ are obtained for as-deposited and annealed films using X-ray diffraction. The determination of δ in textured films is carried out by the new method based on rocking curve analysis. It is found that annealing leads to the texture improvement and to the increasing of δ for all h. The less h, the stronger effects of texture improvement and of δ increasing. These results are explained by the annealing-induced formation of large secondary grains whose volume fraction increases as h decreases. The inhomogeneity of the depth distributions of texture parameters and of δ are investigated for the as-deposited Pt films.

Sign in / Sign up

Export Citation Format

Share Document