Kinetic and mechanistic study of the chemical vapor deposition of titanium dioxide thin films using tetrakis‐(isopropoxo)‐titanium(IV)
1994 ◽
Vol 12
(4)
◽
pp. 1108-1113
◽
2014 ◽
Vol 3
(7)
◽
pp. N107-N113
◽
1992 ◽
Vol 26
(4)
◽
pp. 323-329
◽
Keyword(s):