Synthesis and characterization of SiO2 films deposited using tetraethylorthosilicate/ozone at low processing pressures (10−1 to 10−3)
1992 ◽
Vol 10
(4)
◽
pp. 970-973
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2008 ◽
Vol 26
(2)
◽
pp. 198-204
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1984 ◽
Vol 105
(1)
◽
pp. 259-271
◽
Keyword(s):
Keyword(s):
1999 ◽
Vol 09
(PR8)
◽
pp. Pr8-943-Pr8-951
◽
2013 ◽
Vol 51
(11)
◽
pp. 835-842
Keyword(s):