Ion beam assisted coating and surface modification with plasma source ion implantation

1990 ◽  
Vol 8 (4) ◽  
pp. 3146-3151 ◽  
Author(s):  
J. R. Conrad ◽  
R. A. Dodd ◽  
S. Han ◽  
M. Madapura ◽  
J. Scheuer ◽  
...  
Keyword(s):  
Surface Modification ◽  
Ion Implantation ◽  
Ion Beam ◽  
Plasma Source ◽  
Plasma Source Ion Implantation

Surface modification of aluminum and chromium by ion implantation of nitrogen with a high current density ion implanter and plasma-source ion implantation

1999 ◽  
Vol 14 (11) ◽  
pp. 4351-4357 ◽  
Author(s):  
Zoran Falkenstein ◽  
Kevin C. Walter ◽  
Michael A. Nastasi ◽  
Donald J. Rej ◽  
Nikolai V. Gavrilov
Keyword(s):  
Surface Modification ◽  
Ion Implantation ◽  
Dose Rate ◽  
Current Density ◽  
High Current Density ◽  
Ion Beam ◽  
Plasma Source ◽  
High Current ◽  
Beam Source ◽  
Plasma Source Ion Implantation

Results of ion implantation of nitrogen into electrodeposited hard chromium and pure aluminum by a high-dose ion-beam source are presented and compared to plasma-source ion implantation. The large-area, high current density ion-beam source can be characterized, with respect to surface modification use, by a uniform emitted dose rate in the range of 1016 to 5 × 1017 N cm−2 min−1 over an area of <100 cm2 and with acceleration energies of 10–50 keV. The implantation range and retained dose (measured using ion-beam analysis), the surface hardness, coefficient of friction, and the change in the wear coefficient (measured by nanohardness indentation and pin-on-disk wear testing) that were obtained with an applied dose rate of ∼1.7 × 1017 N cm−2 min−1 at 25 kV are given, and they are compared to results obtained with plasma-source ion implantation.

Materials Science Issues of Plasma Source Ion Implantation

1995 ◽  
Vol 396 ◽  
Author(s):  
M. Nastasi ◽  
A.A. Elmoursi ◽  
R.J. Faehl ◽  
A.H. Hamdi ◽  
I. Henins ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Materials Science ◽  
Ion Beam ◽  
Value Added ◽  
Plasma Source ◽  
Industrial Applications ◽  
Plasma Source Ion Implantation ◽  
Potential Applications ◽  
Surface Modification Techniques ◽  
Wear Coatings

AbstractIon beam processing, including ion implantation and ion beam assisted deposition (IBAD), are established surface modification techniques which have been used successfully to synthesize materials for a wide variety of tribological applications. In spite of the flexibility and promise of the technique, ion beam processing has been considered too expensive for mass production applications. However, an emerging technology, Plasma Source Ion Implantation (PSII), has the potential of overcoming these limitations to become an economically viable tool for mass industrial applications. In PSII, targets are placed directly in a plasma and then pulsed-biased to produce a non-line-of-sight process for intricate target geometries without complicated fixturing. If the bias is a relatively high negative potential (20-100kV) ion implantation will result. At lower voltages (50-1200V), deposition occurs. Potential applications for PSII are in low-value-added products such as tools used in manufacturing, orthopedic devices, and the production of wear coatings for hard disk media. This paper will focus on the technology and materials science associated with PSII.

Polymer surface modification by plasma source ion implantation

1997 ◽  
Vol 93 (2-3) ◽  
pp. 261-264 ◽  
Author(s):  
Seunghee Han ◽  
Yeonhee Lee ◽  
Haidong Kim ◽  
Gon-ho Kim ◽  
Junghye Lee ◽  
...  
Keyword(s):  
Surface Modification ◽  
Ion Implantation ◽  
Polymer Surface ◽  
Plasma Source ◽  
Polymer Surface Modification ◽  
Plasma Source Ion Implantation

Surface modification of monel K-500 by the plasma source ion implantation process

1989 ◽  
Vol 39-40 ◽  
pp. 587-594 ◽  
Author(s):  
M. Madapura ◽  
J.R. Conrad ◽  
F.J. Worzala ◽  
R.A. Dodd ◽  
F.C. Prenger ◽  
...  
Keyword(s):  
Surface Modification ◽  
Ion Implantation ◽  
Plasma Source ◽  
Plasma Source Ion Implantation ◽  
Implantation Process
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