Summary Abstract: Adsorption and reaction of oxygen on Si(100): A modulated molecular beam and time‐resolved x‐ray photoelectron spectroscopy study

Mark P. D’Evelyn; Mark M. Nelson; Thomas Engel

doi:10.1116/1.574656

Summary Abstract: Adsorption and reaction of oxygen on Si(100): A modulated molecular beam and time‐resolved x‐ray photoelectron spectroscopy study

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574656 ◽

1987 ◽

Vol 5 (4) ◽

pp. 642-644

Author(s):

Mark P. D’Evelyn ◽

Mark M. Nelson ◽

Thomas Engel

Keyword(s):

Photoelectron Spectroscopy ◽

Molecular Beam ◽

Spectroscopy Study ◽

Time Resolved ◽

X Ray

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Enhanced Photoresponsivity of Fullerene in the Presence of Phthalocyanine: A Time-Resolved X-ray Photoelectron Spectroscopy Study of Phthalocyanine/C60/TiO2(110)

The Journal of Physical Chemistry C ◽

10.1021/acs.jpcc.9b00186 ◽

2019 ◽

Vol 123 (7) ◽

pp. 4388-4395 ◽

Cited By ~ 3

Author(s):

Kenichi Ozawa ◽

Susumu Yamamoto ◽

Marie D’angelo ◽

Yuto Natsui ◽

Naoya Terashima ◽

...

Keyword(s):

Photoelectron Spectroscopy ◽

Spectroscopy Study ◽

Time Resolved ◽

X Ray

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X-ray photoelectron spectroscopy study of GaAs (001) surface thermocleaning prior to molecular beam epitaxy

Applied Physics A Solids and Surface ◽

10.1007/bf00618725 ◽

1985 ◽

Vol 38 (1) ◽

pp. 45-47 ◽

Cited By ~ 18

Author(s):

J. P. Contour ◽

J. Massies ◽

A. Sal�tes ◽

P. Staib

Keyword(s):

Molecular Beam Epitaxy ◽

Photoelectron Spectroscopy ◽

Molecular Beam ◽

Spectroscopy Study ◽

X Ray

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X-ray photoelectron spectroscopy study on the CrN surface grown on sapphire substrate to control the polarity of ZnO by plasma-assisted molecular beam epitaxy

Applied Surface Science ◽

10.1016/j.apsusc.2009.06.034 ◽

2009 ◽

Vol 255 (20) ◽

pp. 8582-8586 ◽

Cited By ~ 2

Author(s):

J.H. Chang ◽

M.N. Jung ◽

J.S. Park ◽

S.H. Park ◽

I.H. Im ◽

...

Keyword(s):

Molecular Beam Epitaxy ◽

Sapphire Substrate ◽

Photoelectron Spectroscopy ◽

Molecular Beam ◽

Spectroscopy Study ◽

X Ray

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X-Ray Photoelectron Spectroscopy Study of GaAs (001) and InP (001) Cleaning Procedures Prior to Molecular Beam Epitaxy

Japanese Journal of Applied Physics ◽

10.1143/jjap.24.l563 ◽

1985 ◽

Vol 24 (Part 2, No. 7) ◽

pp. L563-L565 ◽

Cited By ~ 21

Author(s):

J. P. Contour ◽

J. Massies ◽

A. Saletes

Keyword(s):

Molecular Beam Epitaxy ◽

Photoelectron Spectroscopy ◽

Molecular Beam ◽

Spectroscopy Study ◽

X Ray ◽

Cleaning Procedures

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Substrate chemical etching prior to molecular‐beam epitaxy: An x‐ray photoelectron spectroscopy study of GaAs {001} surfaces etched by the H2SO4‐H2O2‐H2O solution

Journal of Applied Physics ◽

10.1063/1.336175 ◽

1985 ◽

Vol 58 (2) ◽

pp. 806-810 ◽

Cited By ~ 113

Author(s):

J. Massies ◽

J. P. Contour

Keyword(s):

Molecular Beam Epitaxy ◽

Photoelectron Spectroscopy ◽

Chemical Etching ◽

Molecular Beam ◽

Spectroscopy Study ◽

X Ray

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X-Ray Photoelectron Spectroscopy Study of Si-C Film Growth by Chemical Vapor Deposition of Ethylene on Si(100)

10.21236/ada197437 ◽

1988 ◽

Author(s):

P. A. Taylor ◽

M. Bozack ◽

W. J. Choyke ◽

J. T. Yates ◽

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Photoelectron Spectroscopy ◽

Film Growth ◽

Chemical Vapor ◽

Spectroscopy Study ◽

X Ray

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Time‐of‐flight secondary ion mass spectrometry and X‐ray photoelectron spectroscopy study of 2‐phenylimidazole on brass

Rapid Communications in Mass Spectrometry ◽

10.1002/rcm.8974 ◽

2020 ◽

Vol 35 (2) ◽

Author(s):

Matjaž Finšgar

Keyword(s):

Mass Spectrometry ◽

Photoelectron Spectroscopy ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Spectroscopy Study ◽

X Ray ◽

Ion Mass Spectrometry ◽

Secondary Ion

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A high-resolution X-ray photoelectron spectroscopy study of trifluoroacetic anhydride labelling of hydroxyl groups: demonstration of the β shift due to OC(O)CF3

Polymer ◽

10.1016/0032-3861(93)90418-a ◽

1993 ◽

Vol 34 (9) ◽

pp. 1795-1799 ◽

Cited By ~ 35

Author(s):

A.P. Ameen ◽

R.J. Ward ◽

R.D. Short ◽

G. Beamson ◽

D. Briggs

Keyword(s):

High Resolution ◽

Photoelectron Spectroscopy ◽

Trifluoroacetic Anhydride ◽

Hydroxyl Groups ◽

Spectroscopy Study ◽

X Ray

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Photoinduced Charge Carrier Dynamics and Electron Injection Efficiencies in Au Nanoparticle-Sensitized TiO2 Determined with Picosecond Time-Resolved X-ray Photoelectron Spectroscopy

The Journal of Physical Chemistry Letters ◽

10.1021/acs.jpclett.0c00825 ◽

2020 ◽

Vol 11 (14) ◽

pp. 5476-5481

Author(s):

Mario Borgwardt ◽

Johannes Mahl ◽

Friedrich Roth ◽

Lukas Wenthaus ◽

Felix Brauße ◽

...

Keyword(s):

Charge Carrier ◽

Photoelectron Spectroscopy ◽

Electron Injection ◽

Carrier Dynamics ◽

Au Nanoparticle ◽

Time Resolved ◽

X Ray ◽

Charge Carrier Dynamics ◽

Photoinduced Charge

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An X-ray photoelectron spectroscopy study of the surface layers between diamond crystallites and silicon substrate deposited by microwave-plasma-assisted chemical vapour deposition

Diamond and Related Materials ◽

10.1016/0925-9635(93)90120-q ◽

1993 ◽

Vol 2 (2-4) ◽

pp. 558-561 ◽

Cited By ~ 5

Author(s):

S. Haq ◽

C. Somerton ◽

D. Tunnicliffe ◽

J.A. Savage ◽

P. John ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Silicon Substrate ◽

Photoelectron Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Spectroscopy Study ◽

Surface Layers ◽

X Ray

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