The determination of amorphous layer thickness in ion implanted silicon using secondary ion mass spectrometry
1986 ◽
Vol 4
(6)
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pp. 2492-2498
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2011 ◽
Vol 319-320
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pp. 181-184
2000 ◽
2010 ◽
Keyword(s):
2017 ◽
Vol 49
(11)
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pp. 1057-1063
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Keyword(s):
Keyword(s):
1994 ◽
Vol 80
(12)
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pp. 902-907
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