Thermal stability of heat‐reflective films consisting of oxide–Ag–oxide deposited by dc magnetron sputtering

1986 ◽  
Vol 4 (6) ◽  
pp. 2907-2910 ◽  
Author(s):  
E. Kusano ◽  
J. Kawaguchi ◽  
K. Enjouji
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Thermal Stability Of

Nanocrystallization in magnetron sputtered Zr–Cu–Al–Ag thin film metallic glasses

CrystEngComm ◽  
2014 ◽  
Vol 16 (13) ◽  
pp. 2835-2844 ◽  
Author(s):  
S. Thanka Rajan ◽  
A. K. Nanda Kumar ◽  
B. Subramanian
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Metallic Glasses ◽  
Amorphous Matrix ◽  
Dc Magnetron Sputtering ◽  
Characterization Techniques ◽  
Thermal Stability Of ◽  
Glassy Coating

Zr-based thin film metallic glasses (TFMG) were fabricated from a polycrystalline Zr48Cu36Al8Ag8 (at.%) target by DC magnetron sputtering. A series of characterization techniques were employed to study the structure, composition and thermal stability of the glassy coating. Annealing studies show nanocrystallites of CuZr2 in an amorphous matrix.

Thermal Stability of Lead Oxide Films Prepared by Reactive DC Magnetron Sputtering

2002 ◽  
Vol 194 (1) ◽  
pp. 192-205 ◽  
Author(s):  
S. Venkataraj ◽  
O. Kappertz ◽  
R. Drese ◽  
Ch. Liesch ◽  
R. Jayavel ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Lead Oxide ◽  
Oxide Films ◽  
Dc Magnetron Sputtering ◽  
Thermal Stability Of

scholarly journals Investigation of reactively sputtered TaN thin-film resistors for microwave photonic applications

2021 ◽  
pp. 93-98
Author(s):  
Evgenii Erofeev ◽  
Egor Polyntsev ◽  
Sergei Ishutkin
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Electrical Resistance ◽  
High Thermal Stability ◽  
Tantalum Nitride ◽  
Reactive Magnetron ◽  
Microwave Photonic ◽  
Thin Film Resistors ◽  
Thermal Stability Of

Electrophysical characteristics and their thermal stability of thin-film resistors based on tantalum nitride (TaN) obtained by reactive magnetron sputtering were investigated. The optimal modes of the magnetron sputtering process are determined, ensuring the Ta2N phase film composition with the value of the specific electrical resistance of 250 μm cm and high thermal stability of the parameters. On the basis of the investigations carried out, thin-film matching resistors were manufactured for use as part of an electro-optical InP-based MZ modulator

scholarly journals Thermal Stability of WB2 and W–B–N Films Deposited by Magnetron Sputtering

2019 ◽  
Vol 32 (1) ◽  
pp. 136-144 ◽  
Author(s):  
Yan-Ming Liu ◽  
Tong Li ◽  
Feng Liu ◽  
Zhi-Liang Pei
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Thermal Stability Of
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