Cathode cooling apparatus for a planar magnetron sputtering system

1984 ◽  
Vol 2 (3) ◽  
pp. 1391-1393 ◽  
Author(s):  
M. R. Lake ◽  
G. L. Harding
Keyword(s):  
Magnetron Sputtering ◽  
Planar Magnetron ◽  
Sputtering System

Deposition of Cu-films by a planar magnetron sputtering system at ultra-low operating pressure

2020 ◽  
Vol 389 ◽  
pp. 125600
Author(s):  
M.V. Shandrikov ◽  
I.D. Artamonov ◽  
A.S. Bugaev ◽  
E.M. Oks ◽  
K.V. Oskomov ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Operating Pressure ◽  
Cu Films ◽  
Planar Magnetron ◽  
Sputtering System

Mechanical Property of Magnesium Alloy Surface with Dense Oxide

2018 ◽  
Vol 941 ◽  
pp. 1827-1832
Author(s):  
Akira Watazu ◽  
Tsutomu Sonoda
Keyword(s):  
Magnesium Alloy ◽  
Oxide Film ◽  
Magnetron Sputtering ◽  
Magnesium Oxide ◽  
Single Phase ◽  
Oxide Phase ◽  
Radio Frequency Magnetron Sputtering ◽  
Alloy Substrate ◽  
Planar Magnetron ◽  
Sputtering System

Low Al single-phase magnesium alloy surfaces with dense magnesium oxide films were uniformly formed. The films were deposited with a radio frequency magnetron sputtering process with a planar magnetron sputtering system. The thickness of deposited magnesium oxide thin films was around 240 nm. According to the XRD results, a magnesium oxide phase film was formed on the substrate. The surface was uniform, and no cracks or exfoliation were observed. The deposited magnesium oxide film did not have any cracks or pores, and the surface of the sample was covered by magnesium oxide. The hardness of the magnesium oxide-coated magnesium alloy reached around Hv200, while that of the uncoated Mg-alloy was around Hv80. Moreover, the Vickers indenter under a 10-mN load indented the magnesium alloy substrate coated with the magnesium oxide film to a depth of around 640 nm, while that for the uncoated magnesium alloy substrate was around 620 nm. Meanwhile, the elasticity value for the magnesium alloy substrate coated with magnesium oxide film was around 5.3×1010Pa, while that of the uncoated magnesium alloy substrate was around 4.2×1010Pa.

Planar magnetron-sputtering system with obliquely facing targets

1992 ◽  
pp. 143-147
Author(s):  
Kikuo Tominaga ◽  
Hiroshi Imai ◽  
Yasuhiko Sueyoshi ◽  
Masaki Shirai
Keyword(s):  
Magnetron Sputtering ◽  
Planar Magnetron ◽  
Sputtering System

Observations on the operation of a planar magnetron sputtering system by target erosion patterns

1987 ◽  
Vol 151 (3) ◽  
pp. 373-381 ◽  
Author(s):  
Tatsuo Fukami ◽  
Fumihiko Shintani ◽  
Masahiko Naoe
Keyword(s):  
Magnetron Sputtering ◽  
Planar Magnetron ◽  
Sputtering System

Damage in ZnO Film Preparation by Planar Magnetron Sputtering System with Obliquely Facing Targets of Zn

1992 ◽  
Vol 31 (Part 1, No. 6A) ◽  
pp. 1868-1869 ◽  
Author(s):  
Kikuo Tominaga ◽  
Yasuhiko Sueyoshi ◽  
Masaki Shirai ◽  
Hiroshi Imai
Keyword(s):  
Magnetron Sputtering ◽  
Zno Film ◽  
Planar Magnetron ◽  
Film Preparation ◽  
Sputtering System
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