X‐ray lithography using a pulsed plasma source

1981 ◽  
Vol 19 (4) ◽  
pp. 1190-1193 ◽  
Author(s):  
J. S Pearlman ◽  
J. C. Riordan
Keyword(s):  
Plasma Source ◽  
Pulsed Plasma ◽  
X Ray

Pulsed Plasma Source For X-Ray Lithography

1981 ◽  
Author(s):  
S. M. Matthews ◽  
R. Stringfield ◽  
I. Roth ◽  
R. Cooper ◽  
N. P. Economou ◽  
...  
Keyword(s):  
Plasma Source ◽  
Pulsed Plasma ◽  
X Ray

Pulsed plasma source spectrometry in the 80–8000‐eV x‐ray region

1983 ◽  
Vol 54 (10) ◽  
pp. 1311-1330 ◽  
Author(s):  
B. L. Henke ◽  
H. T. Yamada ◽  
T. J. Tanaka
Keyword(s):  
Plasma Source ◽  
Pulsed Plasma ◽  
X Ray

Material Structure of Microcrystalline Silicon Deposited with an Expanding Thermal Plasma

2003 ◽  
Vol 762 ◽  
Author(s):  
C. Smit ◽  
D.L. Williamson ◽  
M.C.M. van de Sanden ◽  
R.A.C.M.M. van Swaaij
Keyword(s):  
Thermal Plasma ◽  
Hydrogen Plasma ◽  
Plasma Chemistry ◽  
Plasma Source ◽  
Growth Direction ◽  
Interaction Time ◽  
Material Structure ◽  
Average Particle ◽  
Microcrystalline Silicon ◽  
X Ray

AbstractExpanding thermal plasma CVD (ETP CVD) has been used to deposit thin microcrystalline silicon films. In this study we varied the position at which the silane is injected in the expanding hydrogen plasma: relatively far from the substrate and close to the plasma source, giving a long interaction time of the plasma with the silane, and close to the substrate, resulting in a short interaction time. The material structure is studied extensively. The crystalline fractions as obtained from Raman spectroscopy as well as from X-ray diffraction (XRD) vary from 0 to 67%. The average particle sizes vary from 6 to 17 nm as estimated from the (111) XRD peak using the Scherrer formula. Small angle X-ray scattering (SAXS) and flotation density measurements indicate void volume fractions of about 4 to 6%. When the samples are tilted the SAXS signal is lower than for the untilted case, indicating elongated objects parallel to the growth direction in the films. We show that the material properties are influenced by the position of silane injection in the reactor, indicating a change in the plasma chemistry.

Stacking Faults in a High Nitrogen Face-Centered-Cubic Phase Formed on Nitrogen-Modified Austenitic Stainless Steel

2008 ◽  
Vol 373-374 ◽  
pp. 318-321
Author(s):  
J. Liang ◽  
M.K. Lei
Keyword(s):  
Stainless Steel ◽  
Plasma Source ◽  
Peak Shift ◽  
Cubic Phase ◽  
Face Centered Cubic ◽  
X Ray Diffraction ◽  
High Nitrogen ◽  
X Ray ◽  
Peak Asymmetry ◽  
Face Centered

Effects of stacking faults in a high nitrogen face-centered-cubic phase (γΝ) formed on plasma source ion nitrided 1Cr18Ni9Ti (18-8 type) austenitic stainless steel on peak shift and peak asymmetry of x-ray diffraction were investigated based on Warren’s theory and Wagner’s method, respectively. The peak shift from peak position of the γΝ phase is ascribed to the deformation faults density α, while the peak asymmetry of the γΝ phase is characterized by deviation of the center of gravity of a peak from the peak maximum (Δ C.G.) due to the twin faults density β. The calculated peak positions of x-ray diffraction patterns are consistent with that measured for plasma source ion nitrided 1Cr18Ni9Ti stainless steel.

Laser plasma source for soft x-ray imaging in CIOM

1997 ◽  
Author(s):  
Zhongxing Shao ◽  
Zhanshan Wang ◽  
Fengming Xu ◽  
Junxia Lu ◽  
Xingdan Chen
Keyword(s):  
Laser Plasma ◽  
Plasma Source ◽  
X Ray ◽  
X Ray Imaging

Calibration Of A KrF Laser-Plasma Source For X-Ray Microscopy Applications

1988 ◽  
Author(s):  
I C. E. Turcu ◽  
F O'Neill ◽  
U Zammit ◽  
Y Al-Hadithi ◽  
R W. Eason ◽  
...  
Keyword(s):  
Laser Plasma ◽  
Plasma Source ◽  
X Ray ◽  
Krf Laser

Biological specimens imaged by soft x-ray contact microscopy using a plasma source produced with a laboratory sized laser

1986 ◽  
Vol 144 (2) ◽  
pp. RP5-RP6 ◽  
Author(s):  
R. J. Rosser ◽  
R. Feder ◽  
A. Ng ◽  
F. Adams ◽  
M. Caldarolo ◽  
...  
Keyword(s):  
Plasma Source ◽  
X Ray

X-ray powder diffraction data for indium nitride

1999 ◽  
Vol 14 (4) ◽  
pp. 258-260 ◽  
Author(s):  
W. Paszkowicz
Keyword(s):  
Diffraction Pattern ◽  
Powder Diffraction ◽  
Diffraction Data ◽  
Microwave Plasma ◽  
Indium Nitride ◽  
Plasma Source ◽  
Unit Cell ◽  
Powder Diffraction Data ◽  
Calculated Density ◽  
X Ray

X-ray powder diffraction pattern for InN synthesized using a microwave plasma source of nitrogen is reported. The data were obtained with the help of an automated Bragg-Brentano diffractometer using Ni-filtered CuKα radiation. The lattice parameters for the wurtzite-type unit cell are ao=3.5378(1) Å, co=5.7033(1) Å. The calculated density is 6.921±0.002 g/cm3.

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