Abstract: Pulsed electron‐beam processing of material surfaces

1979 ◽  
Vol 16 (6) ◽  
pp. 1838-1839 ◽  
Author(s):  
A. C. Greenwald ◽  
A. R. Kirkpatrick ◽  
R. G. Little ◽  
J. A. Minnucci
Keyword(s):  
Electron Beam ◽  
Pulsed Electron Beam ◽  
Electron Beam Processing ◽  
Material Surfaces

Processing of Polypropylene by Low-Energy Pulsed Electron Beam from Forevacuum Plasma Source

2016 ◽  
Vol 683 ◽  
pp. 95-99 ◽  
Author(s):  
Victor Burdovitsin ◽  
Andrey Kazakov ◽  
Alexandr Medovnik ◽  
Efim Oks ◽  
Irina Puhova ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Irradiation ◽  
Plasma Source ◽  
Beam Current ◽  
Beam Current Density ◽  
Pulsed Electron Beam ◽  
Force Microscopy ◽  
Electron Beam Processing ◽  
Atomic Force ◽  
Energy Flux Density

Influence of electron beam irradiation on the morphology and contact angle of polypropylene was investigated. Electron beam processing was carried out at 8 – 10 kV accelerating voltage and a pressure of 5 – 10 Pa. Beam current density was up to 4.5 A/cm2, and the pulse duration - from 150 to 300 μs. The morphology of irradiated polymer material was studied by scanning-electron and atomic-force microscopy methods. It was established formation of extended equally oriented “hills” divided by “valleys”. The height of hills increases with the growth of energy flux density per pulse.

Temperature profile and crater formation induced in high-current pulsed electron beam processing

2003 ◽  
Vol 21 (6) ◽  
pp. 1934-1938 ◽  
Author(s):  
Ying Qin ◽  
Chuang Dong ◽  
Xiaogang Wang ◽  
Shengzhi Hao ◽  
Aimin Wu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Temperature Profile ◽  
Crater Formation ◽  
High Current ◽  
Pulsed Electron Beam ◽  
Electron Beam Processing

Effect of High-Current Pulsed Electron Beam Processing of Zr-1%Nb Alloy on Its Oxidation Kinetics at 1200C in Air and Steam

CORROSION ◽  
10.5006/3942 ◽  
2021 ◽  
Author(s):  
Mikhail Slobodyan ◽  
Konstantin Ivanov ◽  
Maxim Elkin ◽  
Vasiliy Klimenov ◽  
Sergey Pavlov ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Current ◽  
Surface Layers ◽  
Research Directions ◽  
Temperature Oxidation ◽  
Pulsed Electron Beam ◽  
Electron Beam Processing ◽  
Heating And Cooling ◽  
Loss Of Coolant ◽  
Kinetics Of

The paper reports the effect of high-current pulsed electron beam (HCPEB) processing of the Zr-1%Nb alloy, as one of the most widely used in water-cooled nuclear reactors, on the kinetics of its oxidation at 1200 °C in air and steam (these conditions are typical for potential loss-of-coolant accidents). It was shown that HCPEB processing caused a change in the surface morphology of the samples. In particular, craters with diameters of about 100 μm were found on the modified surfaces. They had initiated at an energy density of 5 J/cm2 and were characterized by relevant reliefs with microcracks. After HCPEB processing at 10 J/cm2, the craters were deeper with fractured surface layers. In addition, a pronounced surface relief corresponding to quenched martensitic microstructures was observed on the modified sample surfaces that had formed due to high heating and cooling rates. Due to sufficient degradation of the sample surfaces after HCPEB processing at 10 J/cm2, the kinetics of high-temperature oxidation was estimated only for the as-received samples and ones treated at 5 J/cm2. It was found that the as-received samples showed slightly greater weight gain levels in both air and steam environments, which fully correlated with the thickness ratio of the oxide, α-Zr(O) and prior-β layers. These phenomena and further research directions were discussed.

Pulsed Electron Beam Processing of Silicon Devices

1980 ◽  
Vol 1 ◽  
Author(s):  
A. C. Greenwald ◽  
R. P. Dolan ◽  
S. P. Tobin
Keyword(s):  
Electron Beam ◽  
Low Temperature ◽  
Low Dose ◽  
Electron Beams ◽  
Pulsed Electron Beam ◽  
Process Sequence ◽  
Pulse Processing ◽  
Silicon Devices ◽  
Electron Beam Processing ◽  
Thermal Oxide

ABSTRACTPulsed electron beams [1] were used to anneal ion-implanted diodes, transistors, and resistors. Devices were fabricated by patterning a thermal oxide on a silicon wafer, ion-implanting and pulse processing with the oxide in place, and then applying contacts. Oxide films over 0.3 micron thick were not damaged, and the silicon below these films was not melted by the pulsed electron beam. Low-dose (101311B+/cm2), implanted, pulse-annealed resistors showed no change in sheet resistance for oxide windows 2.5 to 50.0 microns wide. Diodes were fashioned with good forward and reverse I-V characteristics, with m=1.09 and IO=2.7×10−10 A/cm2 for I=IO exp(qV.mkT)−1 , when a low-temperature (550˚C, 1 hr), postpulse anneal was included in the process sequence. Both bipolar and FET types of transistors were fabricated. Results compare favorably with thermal annealing cycles.

Pulsed-Electron-Beam Processing of Materials for Medical Applications

2014 ◽  
Vol 56 (10) ◽  
pp. 1150-1155 ◽  
Author(s):  
N. N. Koval ◽  
Yu. F. Ivanov ◽  
A. D. Teresov ◽  
Yu. A. Denisova ◽  
E. A. Petrikova
Keyword(s):  
Electron Beam ◽  
Medical Applications ◽  
Pulsed Electron Beam ◽  
Electron Beam Processing

Soft Vacuum, Pulsed Electron Beam Processing of Polyimides

1987 ◽  
Vol 101 ◽  
Author(s):  
J. Krishnaswamy ◽  
L. Li ◽  
G. J. Collins ◽  
H. Hiraoka ◽  
Mary Ann Caolo
Keyword(s):  
Electron Beam ◽  
Low Voltage ◽  
Electron Beams ◽  
Thermal Cure ◽  
Beam Hardening ◽  
Polyamic Acid ◽  
Pulsed Electron Beam ◽  
Substrate Distance ◽  
Electron Beam Processing ◽  
Oxygen Discharge

ABSTRACTWe report on the successful patterning of polyamic acid over wide areas using 28 kV pulsed electron beams produced in 30 mTorr air. The pattern degradation during the 350°C, 1/2 hr, imidizing thermal cure is prevented by pulsed, flood electron beam hardening of the developed polyamic acid patterns using the same soft vacuum, pulsed electron beam apparatus. It is also shown that a CW, low voltage, 1 to 3 kV electron beam sustained oxygen discharge can be used to completely strip the hardened, imidized material which is difficult to remove by wet methods. We also present, dose versus thickness remaining characteristics as a function of electron source to substrate distance and some examples of polyimide patterning.

Structure and Properties of the Surface Layer of a Wear-Resistant Coating on Martensitic Steel after Electron-Beam Processing

2017 ◽  
Vol 906 ◽  
pp. 101-106 ◽  
Author(s):  
Sergey V. Konovalov ◽  
V.E. Kormyshev ◽  
Yu.F. Ivanov ◽  
V.E. Gromov ◽  
I.A. Komissarova
Keyword(s):  
Surface Layer ◽  
Electron Beam ◽  
Layer Structure ◽  
Niobium Carbide ◽  
Young Modulus ◽  
Structural Elements ◽  
Cored Wire ◽  
Pulsed Electron Beam ◽  
Electron Beam Processing ◽  
Modified Surface

The paper reports electro-contact welding on Hardox 450 steel with С-V-Cr-Nb-W flux-cored wire. Supplementary irradiation by intense pulsed electron beam was carried out to improve mechanical properties. Micro-and nanohardness, Young modulus and tribological parameters of the modified surface were tested mechanically. It is pointed at the significant increase in the friction coefficient because the surface layer fractures and particles of the surfaced layer are involved in the process of friction. Using the methods of optical and scanning microscopy a great number of micro-pores were detected both on the irradiated surface and through the surfaced layer modified by intense pulsed electron beam. It is demonstrated that electron-beam processing of the deposited layer surface is the reason for occurrence of multi-layer structure. According to measurements it was determined that the modified (surface and transition) layers are 0.3 to 0.5 μm on overage. It was also found out that irradiation of the surfaced metal leads to significant refining of structural elements because of ultrahigh speeds of crystallization and further cooling down of the modified layer. The phase composition of the surfaced metal modified by pulsed electron beam is explored. Niobium carbide (NbC) is reported to form in the surface layer.

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