Etching of Si3N4 induced by electron beam plasma from hollow cathode plasma in a downstream reactive environment
2020 ◽
Vol 38
(3)
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pp. 032208
2007 ◽
Vol 50
(6)
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pp. 521-527
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Keyword(s):
2020 ◽
Vol 12
(1)
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pp. 5-11
1996 ◽
Vol 65
(7)
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pp. 2081-2086
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1991 ◽
Vol 60
(1)
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pp. 344B-344B
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