Ultraviolet light-emitting diode arrays using Ga-doped ZnO as current spreading layer

Author(s):  
Wu-Liang Bi ◽  
Wei-Hao Lee ◽  
Hsin-Hao Yeh ◽  
Meng-Chyi Wu
Vacuum ◽  
2019 ◽  
Vol 166 ◽  
pp. 370-376 ◽  
Author(s):  
Payal Manzhi ◽  
Reena Kumari ◽  
Md.B. Alam ◽  
G.R. Umapathy ◽  
Richa Krishna ◽  
...  

2008 ◽  
Vol 45 (4) ◽  
pp. 25-32 ◽  
Author(s):  
L. Dimitrocenko ◽  
J. Grube ◽  
P. Kulis ◽  
G. Marcins ◽  
B. Polyakov ◽  
...  

AlGaN-InGaN-GaN Near Ultraviolet Light Emitting DiodeA 382-nm InGaN/AlGaN light-emitting diode (LED) was made on a sapphire substrate by metal-organic vapour phase deposition (MOCVD) technique. Growing of the undoped and Si-doped GaN and AlxGa1-xN monocrystalline layers with a surface roughness of < 1 nm required for making light emitting devices has been carried out. To enhance the LED emission efficiency, a modified symmetric composition of an active single quantum well (SQW) structure was proposed. In addition to the conventional p-doped AlGaN:Mg electron overflow blocking barrier, ann-doped AlGaN:Si SQW barrier layer in the structure was formed that was meant to act as an additional electron tunneling barrier.


2013 ◽  
Vol 370 ◽  
pp. 314-318 ◽  
Author(s):  
Byung Oh Jung ◽  
Yong Hun Kwon ◽  
Dong Ju Seo ◽  
Dong Seon Lee ◽  
Hyung Koun Cho

ACS Omega ◽  
2018 ◽  
Vol 3 (10) ◽  
pp. 13798-13807 ◽  
Author(s):  
You-Ting Tsai ◽  
Shoou-Jinn Chang ◽  
Liang-Wen Ji ◽  
Yu-Jen Hsiao ◽  
I-Tseng Tang ◽  
...  

2019 ◽  
Vol 794 ◽  
pp. 8-12 ◽  
Author(s):  
Ruxue Ni ◽  
Chang-Cheng Chuo ◽  
Kun Yang ◽  
Yujie Ai ◽  
Lian Zhang ◽  
...  

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