Homologous substrate-temperature dependence of structure and properties of TiO2, ZrO2, and HfO2 thin films deposited by reactive sputtering

2019 ◽  
Vol 37 (5) ◽  
pp. 051508 ◽  
Author(s):  
Eiji Kusano
2004 ◽  
Vol 78 (5) ◽  
pp. 761-764 ◽  
Author(s):  
J.D. Ye ◽  
S.L. Gu ◽  
S.M. Zhu ◽  
F. Qin ◽  
L.Q. Hu ◽  
...  

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