scholarly journals Monte Carlo simulations of atomic layer deposition on 3D large surface area structures: Required precursor exposure for pillar- versus hole-type structures

2017 ◽  
Vol 35 (1) ◽  
pp. 01B115 ◽  
Author(s):  
Véronique Cremers ◽  
Filip Geenen ◽  
Christophe Detavernier ◽  
Jolien Dendooven
Keyword(s):  
Monte Carlo ◽  
Atomic Layer Deposition ◽  
Monte Carlo Simulations ◽  
Surface Area ◽  
Atomic Layer ◽  
Large Surface Area ◽  
Layer Deposition

ZnO 1D nanostructures designed by combining atomic layer deposition and electrospinning for UV sensor applications

2014 ◽  
Vol 2 (48) ◽  
pp. 20650-20658 ◽  
Author(s):  
Adib Abou Chaaya ◽  
Mikhael Bechelany ◽  
Sebastien Balme ◽  
Philippe Miele
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Area ◽  
Atomic Layer ◽  
Large Surface Area ◽  
1D Nanostructures ◽  
Uv Sensor ◽  
Sensor Applications ◽  
Layer Deposition ◽  
New Material

We explored a new material with a large surface area to enhance the performance of UV photodetection.

scholarly journals Kinetic Monte Carlo Study of the Atomic Layer Deposition of Zinc Oxide

2018 ◽  
Vol 122 (47) ◽  
pp. 27044-27058 ◽  
Author(s):  
Timo Weckman ◽  
Mahdi Shirazi ◽  
Simon D. Elliott ◽  
Kari Laasonen
Keyword(s):  
Monte Carlo ◽  
Zinc Oxide ◽  
Atomic Layer Deposition ◽  
Kinetic Monte Carlo ◽  
Monte Carlo Study ◽  
Atomic Layer ◽  
Layer Deposition

High-Surface Area Ceria-Zirconia Films Prepared by Atomic Layer Deposition

2017 ◽  
Vol 147 (6) ◽  
pp. 1464-1470 ◽  
Author(s):  
Tzia Ming Onn ◽  
Sheng Dai ◽  
Jiayao Chen ◽  
Xiaoqing Pan ◽  
George W. Graham ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Area ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Zirconia Films

scholarly journals Novel Catalysts for Selective Catalytic Reduction of NOx by NH3 Prepared by Atomic Layer Deposition of V and Ti Oxides on SiO2 Powder

2020 ◽  
Vol 2 (1) ◽  
pp. 33
Author(s):  
Davyd Urbanas ◽  
Pranas Baltrėnas ◽  
Saeed Saedy ◽  
Aristeidis Goulas ◽  
J. Ruud van Ommen
Keyword(s):  
Nitrogen Oxides ◽  
Atomic Layer Deposition ◽  
Specific Surface ◽  
Selective Catalytic Reduction ◽  
Surface Area ◽  
Catalytic Reduction ◽  
Atomic Layer ◽  
Nh3 Scr ◽  
Layer Deposition ◽  
Highly Porous

Based on the 2019 report of the European Environment Agency on Air Quality in Europe nitrogen oxides (NOx) were identified as the most harmful air pollutants in terms of damage to ecosystems. Moreover, in Europe, NO2 is pinpointed as one of the most dangerous pollutants for human health. Anthropogenic emissions of NOx are mainly generated by the combustion of fossil fuels. Nitrogen oxides being emitted into the atmosphere cause environmental problems such as acid rain, acidification of soil, lakes and rivers, eutrophication and photochemical smog. The most effective and widely applicable technology to date for the purification of flue gases from NOx is selective catalytic reduction using ammonia (NH3-SCR de-NOx). Nowadays, one of the most significant research fields in NH3-SCR de-NOx is the application of unconventional reduction methods and the preparation of novel catalysts possessing high specific surface area, uniformity, dispersion of active sites, activity and selectivity. Atomic layer deposition (ALD) is an attractive technique for the deposition of uniformly distributed active catalytic layers, or nanoparticles, on highly porous substrates characterized by a complex structure. For this type of materials, conventional catalyst preparation methods (e.g., impregnation or deposition precipitation) can encounter several limitations. The significant advantage of ALD for the preparation of supported catalysts is that the process can be controlled on the atomic scale, providing the required thickness of an active layer, synthesized with a sub-nm accuracy. Moreover, ALD ensures the formation of catalytic sites from the gas phase, which enhances the possibility of active species being deposited inside pores which are very small in size. In this study, ALD was applied to the preparation of VxOy-based NH3-SCR de-NOx catalysts. Highly porous silica gel powder (63–100 μm) with a specific surface area of up to 450 m2·g−1 was used as a substrate for VxOy/SiO2 with different metal loadings (wt.%). In addition (VxOy+TiO2)/SiO2 catalysts were prepared by applying vanadium (V) tri-i-propoxy oxide (VTIP) and titanium tetrachloride (TiCl4) as precursors with deionized water as the co-reactant. Elemental analysis (ICP-OES) revealed that vanadium loadings of the VxOy/SiO2 catalysts were 0.3, 0.7, 1.1 and 1.60 wt.%, while the loadings in the TiO2-promoted VxOy/SiO2 catalyst were 1.0 and 0.2 wt.% for V and Ti, respectively. The obtained XPS spectra indicated the presence of V2O3 and V2O5 species (V2O5/V2O3 ratio was 1.6 and 6.3 for the as-synthesized and calcined samples respectively). Vanadium(V) oxide is known to be a catalytically active compound for NH3-SCR de-NOx. Additionally, TEM, XRD and N2 adsorption (BET) analyses were conducted to provide a comprehensive characterization of the species size, crystalline phase and porosity of the catalysts prepared.

Smart Pd Catalyst with Improved Thermal Stability Supported on High-Surface-Area LaFeO3Prepared by Atomic Layer Deposition

2018 ◽  
Vol 140 (14) ◽  
pp. 4841-4848 ◽  
Author(s):  
Tzia Ming Onn ◽  
Matteo Monai ◽  
Sheng Dai ◽  
Emiliano Fonda ◽  
Tiziano Montini ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Atomic Layer Deposition ◽  
Surface Area ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Pd Catalyst ◽  
Layer Deposition

scholarly journals Growth of lithium hydride thin films from solutions: Towards solution atomic layer deposition of lithiated films

2019 ◽  
Vol 10 ◽  
pp. 1443-1451
Author(s):  
Ivan Kundrata ◽  
Karol Fröhlich ◽  
Lubomír Vančo ◽  
Matej Mičušík ◽  
Julien Bachmann
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Surface Area ◽  
Photoelectron Spectroscopy ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Atomic Layer ◽  
Lithium Hydride ◽  
X Ray ◽  
Layer Deposition

Lithiated thin films are necessary for the fabrication of novel solid-state batteries, including the electrodes and solid electrolytes. Physical vapour deposition and chemical vapour deposition can be used to deposit lithiated films. However, the issue of conformality on non-planar substrates with large surface area makes them impractical for nanobatteries the capacity of which scales with surface area. Atomic layer deposition (ALD) avoids these issues and is able to deposit conformal films on 3D substrates. However, ALD is limited in the range of chemical reactions, due to the required volatility of the precursors. Moreover, relatively high temperatures are necessary (above 100 °C), which can be detrimental to electrode layers and substrates, for example to silicon into which the lithium can easily diffuse. In addition, several highly reactive precursors, such as Grignard reagents or n-butyllithium (BuLi) are only usable in solution. In theory, it is possible to use BuLi and water in solution to produce thin films of LiH. This theoretical reaction is self-saturating and, therefore, follows the principles of solution atomic layer deposition (sALD). Therefore, in this work the sALD technique and principles have been employed to experimentally prove the possibility of LiH deposition. The formation of homogeneous air-sensitive thin films, characterized by using ellipsometry, grazing incidence X-ray diffraction (GIXRD), in situ quartz crystal microbalance, and scanning electron microscopy, was observed. Lithium hydride diffraction peaks have been observed in as-deposited films by GIXRD. X-ray photoelectron spectroscopy and Auger spectroscopy analysis show the chemical identity of the decomposing air-sensitive films. Despite the air sensitivity of BuLi and LiH, making many standard measurements difficult, this work establishes the use of sALD to deposit LiH, a material inaccessible to conventional ALD, from precursors and at temperatures not suitable for conventional ALD.

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