scholarly journals Tunable optical properties in atomic layer deposition grown ZnO thin films

2017 ◽  
Vol 35 (1) ◽  
pp. 01B108 ◽  
Author(s):  
Dipayan Pal ◽  
Aakash Mathur ◽  
Ajaib Singh ◽  
Jaya Singhal ◽  
Amartya Sengupta ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Zno Thin Films ◽  
Layer Deposition ◽  
Tunable Optical Properties

scholarly journals W:Al2O3 Nanocomposite Thin Films with Tunable Optical Properties Prepared by Atomic Layer Deposition

2016 ◽  
Vol 120 (27) ◽  
pp. 14681-14689 ◽  
Author(s):  
Shaista Babar ◽  
Anil U. Mane ◽  
Angel Yanguas-Gil ◽  
Elham Mohimi ◽  
Richard T. Haasch ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Nanocomposite Thin Films ◽  
Tunable Optical Properties

Growth morphology and electrical/optical properties of Al-doped ZnO thin films grown by atomic layer deposition

2012 ◽  
Vol 30 (2) ◽  
pp. 021202 ◽  
Author(s):  
Tara Dhakal ◽  
Daniel Vanhart ◽  
Rachel Christian ◽  
Abhishek Nandur ◽  
Anju Sharma ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Zno Thin Films ◽  
Growth Morphology ◽  
Layer Deposition ◽  
Doped Zno

scholarly journals Effect of substrates and thickness on optical properties in atomic layer deposition grown ZnO thin films

2017 ◽  
Vol 421 ◽  
pp. 341-348 ◽  
Author(s):  
Dipayan Pal ◽  
Jaya Singhal ◽  
Aakash Mathur ◽  
Ajaib Singh ◽  
Surjendu Dutta ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Zno Thin Films ◽  
Layer Deposition

Effect of Annealing Atmosphere on the Structural and Optical Properties of ZnO Thin Films on Si (100) Substrates Grown by Atomic Layer Deposition

2015 ◽  
Vol 37 ◽  
pp. 92-98 ◽  
Author(s):  
J.L. Tian ◽  
Gui Gen Wang ◽  
Hua Yu Zhang
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Atomic Layer Deposition ◽  
Hexagonal Wurtzite Structure ◽  
Atomic Layer ◽  
Zno Thin Films ◽  
Annealing Atmosphere ◽  
Structural And Optical Properties ◽  
Layer Deposition ◽  
Crystallographic Planes

ZnO thin films were deposited on Si (100) substrates by atomic layer deposition. Annealing treatments for the as-deposited films were performed in nitrogen, oxygen, argon and air at 800 °C, respectively. The influence of annealing atmosphere on the structural and optical properties of the ALD-ZnO thin films was investigated by XRD, SEM, and PL. Results reveals that the films annealed in oxygen atmosphere exhibited excellent crystallinity (polycrystalline hexagonal wurtzite structure with a strong (002) preferred crystallographic planes), relatively smooth surface and better luminescence performance, which means that O2 is the most suitable annealing atmosphere for obtaining high quality ALD-ZnO thin films.

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