Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
2016 ◽
Vol 34
(1)
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pp. 01A136
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2014 ◽
Vol 6
(6)
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pp. 3799-3804
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2021 ◽
Vol 224
◽
pp. 111010
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2003 ◽
Vol 42
(Part 2, No. 4B)
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pp. L414-L416
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Keyword(s):
2007 ◽
pp. 689-692
2007 ◽
Vol 50
(6)
◽
pp. 1827
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