scholarly journals Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor–insulator–semiconductor heterojunction solar cell

2015 ◽  
Vol 33 (4) ◽  
pp. 041101 ◽  
Author(s):  
Florian Talkenberg ◽  
Stefan Illhardt ◽  
György Zoltán Radnóczi ◽  
Béla Pécz ◽  
Gabriele Schmidl ◽  
...  
Keyword(s):  
Solar Cell ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Heterojunction Solar Cell ◽  
Surface Plasma ◽  
Layer Deposition ◽  
Plasma Pretreatment

scholarly journals Heterojunction Solar Cell with Carrier Selective Contact Using MoOx Deposited by Atomic Layer Deposition

2019 ◽  
Vol 29 (5) ◽  
pp. 322-327 ◽  
Author(s):  
Min Ji Jeong ◽  
◽  
Young Joon Jo ◽  
Sun Hwa Lee ◽  
Joon Shin Lee ◽  
...  
Keyword(s):  
Solar Cell ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Heterojunction Solar Cell ◽  
Layer Deposition

ZnO/Si heterojunction solar cell fabricated by atomic layer deposition and hydrothermal methods

Solar Energy ◽  
2017 ◽  
Vol 155 ◽  
pp. 1282-1288 ◽  
Author(s):  
R. Pietruszka ◽  
B.S. Witkowski ◽  
E. Zielony ◽  
K. Gwozdz ◽  
E. Placzek-Popko ◽  
...  
Keyword(s):  
Solar Cell ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Heterojunction Solar Cell ◽  
Layer Deposition ◽  
Hydrothermal Methods

Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment

2016 ◽  
Vol 3 (21) ◽  
pp. 1600340 ◽  
Author(s):  
Suk Won Park ◽  
Kiho Bae ◽  
Jun Woo Kim ◽  
Gyeong Beom Lee ◽  
Byoung-Ho Choi ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Oxygen Plasma ◽  
Atomic Layer ◽  
Chemical Protection ◽  
Layer Deposition ◽  
Plasma Pretreatment

Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment

2019 ◽  
Vol 40 (1) ◽  
pp. 012806 ◽  
Author(s):  
Hui Hao ◽  
Xiao Chen ◽  
Zhengcheng Li ◽  
Yang Shen ◽  
Hu Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Gallium Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Plasma Pretreatment

Toward an all-Atomic Layer Deposition (ALD) process for Cu(In,Ga)(S,Se)2 (CIGS)-type solar cell

2019 ◽  
Vol 200 ◽  
pp. 109965 ◽  
Author(s):  
Harold Le Tulzo ◽  
Nathanaelle Schneider ◽  
Daniel Lincot ◽  
Frédérique Donsanti
Keyword(s):  
Solar Cell ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition
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