scholarly journals Mask roughness challenges in extreme ultraviolet mask development

2011 ◽  
Vol 29 (6) ◽  
pp. 06F501 ◽  
Author(s):  
Patrick Naulleau ◽  
Brittany McClinton ◽  
Kenneth A. Goldberg ◽  
Iacopo Mochi ◽  
Abbas Rastegar
Keyword(s):  
Extreme Ultraviolet ◽  
Mask Roughness

Extreme ultraviolet mask roughness: requirements, characterization, and modeling

2014 ◽  
Author(s):  
Patrick Naulleau ◽  
Suchit Bhattaria ◽  
Rick Chao ◽  
Rene Claus ◽  
Kenneth Goldberg ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Mask Roughness

scholarly journals Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations

2011 ◽  
Vol 50 (19) ◽  
pp. 3346 ◽  
Author(s):  
Patrick P. Naulleau ◽  
Simi A. George
Keyword(s):  
Extreme Ultraviolet ◽  
Mask Roughness

Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

2018 ◽  
Vol 189 (03) ◽  
pp. 323-334 ◽  
Author(s):  
D.B. Abramenko ◽  
P.S. Antsiferov ◽  
D.I. Astakhov ◽  
Aleksandr Yu. Vinokhodov ◽  
Il'ya Yu. Vichev ◽  
...  
Keyword(s):  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Mask Inspection ◽  
Extreme Ultraviolet Radiation

Equipment for Subpicosecond Extreme Ultraviolet Facility.

1986 ◽  
Author(s):  
Charles K. Rhodes ◽  
Keith Boyer ◽  
Tsing Shan Luk
Keyword(s):  
Extreme Ultraviolet
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