Rare-earth oxide/TiN gate stacks on high mobility strained silicon on insulator for fully depleted metal-oxide-semiconductor field-effect transistors

Author(s):  
E. Durğun Özben ◽  
J. M. J. Lopes ◽  
A. Nichau ◽  
R. Lupták ◽  
S. Lenk ◽  
...  
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