Secondary ion mass spectrometry characterization of anomalous behavior for low dose ion implanted phosphorus in silicon
2010 ◽
Vol 28
(3)
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pp. 511-516
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Keyword(s):
2002 ◽
Vol 33
(12)
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pp. 924-931
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1980 ◽
Vol 74
(1)
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pp. 150-162
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2009 ◽
Vol 60
(1)
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pp. 60-64
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1991 ◽
Vol 9
(4)
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pp. 2402-2404
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Keyword(s):