Resolution and total blur: Correlation and focus dependencies in e-beam lithography

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3246365 ◽

2009 ◽

Vol 27 (6) ◽

pp. 2722 ◽

Cited By ~ 6

Author(s):

K. Keil ◽

M. Hauptmann ◽

J. Kretz ◽

C. Constancias ◽

L. Pain ◽

...

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