Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor

2009 ◽  
Vol 27 (1) ◽  
pp. 13-19 ◽  
Author(s):  
Dougyong Sung ◽  
Sangmin Jeong ◽  
Youngmin Park ◽  
Vladimir N. Volynets ◽  
Andrey G. Ushakov ◽  
...  
Keyword(s):  
Phase Shift ◽  
Etch Rate ◽  
Plasma Reactor ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

scholarly journals A technique for evaluating the RF voltage across the electrodes of a capacitively-coupled plasma reactor

2006 ◽  
Vol 36 (2) ◽  
pp. 177-182 ◽  
Author(s):  
V. Lisovskiy ◽  
J.-P. Booth ◽  
K. Landry ◽  
D. Douai ◽  
V. Cassagne ◽  
...  
Keyword(s):  
Plasma Reactor ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

scholarly journals Enhancement of Cleanliness and Deposition Rate by Understanding the Multiple Roles of the Showerhead Electrode in a Capacitively Coupled Plasma Reactor

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 999
Author(s):  
Ho Jun Kim
Keyword(s):  
Deposition Rate ◽  
Complex Geometry ◽  
Plasma Reactor ◽  
Three Dimensional ◽  
Multiple Roles ◽  
Capacitively Coupled ◽  
Large Particles ◽  
Capacitively Coupled Plasma ◽  
Physical Phenomena ◽  
Number Of Particles

Increasing the productivity of a showerhead-type capacitively coupled plasma (CCP) reactor requires an in-depth understanding of various physical phenomena related to the showerhead, which is not only responsible for gas distribution, but also acts as the electrode. Thus, we investigated how to enhance the cleanliness and deposition rate by studying the multiple roles of the showerhead electrode in a CCP reactor. We analyzed the gas transport in a three-dimensional complex geometry, and the SiH4/He discharges were simulated in a two-dimensional simplified geometry. The process volume was installed between the showerhead electrode (radio frequency powered) and the heater electrode (grounded). Our aim of research was to determine the extent to which the heated showerhead contributed to increasing the deposition rate and to reducing the size of the large particles generated during processing. The temperature of the showerhead was increased to experimentally measure the number of particles transported onto the heater to demonstrate the effects thereof on the decrease in contamination. The number of particles larger than 45 nm decreased by approximately 93% when the showerhead temperature increased from 373 to 553 K.

scholarly journals Computational Fluid Dynamics Analysis of Particle Deposition Induced by a Showerhead Electrode in a Capacitively Coupled Plasma Reactor

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 1004
Author(s):  
Ho Jun Kim ◽  
Jung Hwan Yoon
Keyword(s):  
Fluid Dynamics ◽  
Computational Fluid Dynamics ◽  
Particle Deposition ◽  
Complex Geometry ◽  
Plasma Reactor ◽  
Electrode Spacing ◽  
Plasma Discharges ◽  
Capacitively Coupled ◽  
Computational Fluid Dynamics Analysis ◽  
Capacitively Coupled Plasma

Defect formation in the deposition of thin films for semiconductors is not yet sufficiently understood. In a showerhead-type capacitively coupled plasma (CCP) deposition reactor, the showerhead acts as both the gas distributor and the electrode. We used computational fluid dynamics to investigate ways to enhance cleanliness by analyzing the particle deposition induced by the showerhead electrode in a CCP reactor. We analyzed particle transport phenomena using a three-dimensional complex geometry, whereas SiH4/He discharges were simulated in a two-dimensional simplified geometry. The process volume was located between the RF-powered showerhead and the grounded heater. We demonstrated that the efficient transportation of particles with a radius exceeding 1 μm onto the heater is facilitated by acceleration inside the showerhead holes. Because the available space in which to flow inside the showerhead is constricted, high gas velocities within the showerhead holes can accelerate particles and lead to inertia-enhanced particle deposition. The effect of the electrode spacing on the deposition of particles generated in plasma discharges was also investigated. Smaller electrode spacing promoted the deposition of particles fed from the showerhead on the heater, whereas larger electrode spacing facilitated the deposition of particles generated in plasma discharges on the heater.

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