Energy distribution and flux of fast neutrals and residual ions extracted from a neutral beam source

2006 ◽  
Vol 24 (5) ◽  
pp. 1839-1846 ◽  
Author(s):  
Alok Ranjan ◽  
Vincent M. Donnelly ◽  
Demetre J. Economou
1980 ◽  
Vol 51 (9) ◽  
pp. 1163-1167 ◽  
Author(s):  
M. M. Menon ◽  
C. C. Tsai ◽  
D. E. Schechter ◽  
P. M. Ryan ◽  
G. C. Barber ◽  
...  

2000 ◽  
Vol 40 (3Y) ◽  
pp. 589-597 ◽  
Author(s):  
P Massmann ◽  
P Bayetti ◽  
J Bucalossi ◽  
C Desgranges ◽  
E. Di Pietro ◽  
...  

2012 ◽  
Vol 5 (3) ◽  
pp. 035801 ◽  
Author(s):  
Yasuhiro Hara ◽  
Keigo Takeda ◽  
Koji Yamakawa ◽  
Shoji Den ◽  
Hirotaka Toyoda ◽  
...  
Keyword(s):  

2003 ◽  
Vol 169-170 ◽  
pp. 254-257 ◽  
Author(s):  
M.M. Morshed ◽  
D.C. Cameron ◽  
B.P. McNamara ◽  
M.S.J. Hashmi
Keyword(s):  

1992 ◽  
Vol 279 ◽  
Author(s):  
Lee Chen ◽  
Akihisa Sekiguchi ◽  
Dragan Podlesnik

ABSTRACTAn unique method is used to produce a low energy nonthermalized fast neutral radical beam wliich can activate the SiO2 surface for chemical reaction at the desired incident energy. The fast neutral beam energy is continuously adjustable (2eV<Ek<200eV) and the beam flux is typically 5×1015cm−2 sec−1(∼4L). An uniform large diameter plasma is also made for the production of neutral beam covering 5”wafer and larger. Large diameter neutral beam single wafer reactor is feasible with off-the-shelf pumping technology.


2016 ◽  
Vol 18 (12) ◽  
pp. 125002 ◽  
Author(s):  
P Sonato ◽  
P Agostinetti ◽  
U Fantz ◽  
T Franke ◽  
I Furno ◽  
...  

2020 ◽  
Vol 159 ◽  
pp. 111628 ◽  
Author(s):  
P. Agostinetti ◽  
T. Franke ◽  
U. Fantz ◽  
C. Hopf ◽  
N. Mantel ◽  
...  

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