Effect of oxygen incorporation on structural and properties of Ti–Si–N nanocomposite coatings deposited by reactive unbalanced magnetron sputtering

X. Z. Ding; X. T. Zeng; Y. C. Liu; L. R. Zhao

doi:10.1116/1.2202128

Effect of oxygen incorporation on structural and properties of Ti–Si–N nanocomposite coatings deposited by reactive unbalanced magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2202128 ◽

2006 ◽

Vol 24 (4) ◽

pp. 974-977 ◽

Cited By ~ 7

Author(s):

X. Z. Ding ◽

X. T. Zeng ◽

Y. C. Liu ◽

L. R. Zhao

Keyword(s):

Magnetron Sputtering ◽

Nanocomposite Coatings ◽

Oxygen Incorporation ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Effect Of Oxygen

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Deposition and characterization of TiAlN/Si3N4 superhard nanocomposite coatings prepared by reactive direct current unbalanced magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2006.07.003 ◽

2006 ◽

Vol 81 (4) ◽

pp. 479-488 ◽

Cited By ~ 62

Author(s):

Harish C. Barshilia ◽

B. Deepthi ◽

K.S. Rajam

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Nanocomposite Coatings ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Deposition and characterization of TiAlSiN nanocomposite coatings prepared by reactive pulsed direct current unbalanced magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2010.04.028 ◽

2010 ◽

Vol 256 (21) ◽

pp. 6420-6426 ◽

Cited By ~ 54

Author(s):

Harish C. Barshilia ◽

Moumita Ghosh ◽

Shashidhara ◽

Raja Ramakrishna ◽

K.S. Rajam

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Nanocomposite Coatings ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Pulsed Direct Current

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Microstructure and tribology of TiC(Ag)/a-C:H nanocomposite coatings deposited by unbalanced magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2012.01.036 ◽

2012 ◽

Vol 206 (14) ◽

pp. 3299-3308 ◽

Cited By ~ 35

Author(s):

Yunfeng Wang ◽

Jun Wang ◽

Guangan Zhang ◽

Liping Wang ◽

Pengxun Yan

Keyword(s):

Magnetron Sputtering ◽

Nanocomposite Coatings ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Structure and properties of Ti–B–C–N nanocomposite coatings synthesized using pulsed closed field unbalanced magnetron sputtering (P-CFUBMS)

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2008.06.083 ◽

2008 ◽

Vol 203 (5-7) ◽

pp. 588-593 ◽

Cited By ~ 20

Author(s):

J. Lin ◽

B. Mishra ◽

J.J Moore ◽

M. Pinkas ◽

W.D. Sproul

Keyword(s):

Magnetron Sputtering ◽

Nanocomposite Coatings ◽

Closed Field ◽

Structure And Properties ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Superhard nanocomposite coatings of TiN/Si3N4 prepared by reactive direct current unbalanced magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2005.11.124 ◽

2006 ◽

Vol 201 (1-2) ◽

pp. 329-337 ◽

Cited By ~ 54

Author(s):

Harish C. Barshilia ◽

B. Deepthi ◽

A.S. Arun Prabhu ◽

K.S. Rajam

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Nanocomposite Coatings ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Deposition and characterization of CrN/Si3N4 and CrAlN/Si3N4 nanocomposite coatings prepared using reactive DC unbalanced magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2007.04.002 ◽

2007 ◽

Vol 201 (24) ◽

pp. 9468-9475 ◽

Cited By ~ 33

Author(s):

Harish C. Barshilia ◽

B. Deepthi ◽

K.S. Rajam

Keyword(s):

Magnetron Sputtering ◽

Nanocomposite Coatings ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Electrochemical behavior of superhard nanocomposite coatings of TiN/Si3N4 prepared by reactive DC unbalanced magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2013.03.001 ◽

2013 ◽

Vol 224 ◽

pp. 42-48 ◽

Cited By ~ 12

Author(s):

V. Ezhil Selvi ◽

V.K. William Grips ◽

Harish C. Barshilia

Keyword(s):

Magnetron Sputtering ◽

Electrochemical Behavior ◽

Nanocomposite Coatings ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Deposition Behavior of Boron Carbide Thin Film Deposited by Unbalanced Magnetron Sputtering Method

Korean Journal of Metals and Materials ◽

10.3365/kjmm.2014.52.12.969 ◽

2014 ◽

Vol 52 (12) ◽

pp. 969-974

Author(s):

Young Joon Baik ◽

Kyung Eun Bae ◽

Jong Keuk Park ◽

Wook Seong Lee

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Boron Carbide ◽

Deposition Behavior ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Electrical properties of ZnO-based photodetector prepared by room temperature DC unbalanced magnetron sputtering

10.1117/12.2243831 ◽

2016 ◽

Cited By ~ 2

Author(s):

Eka Nurfani ◽

Angga Virdian ◽

Robi Kurniawan ◽

Shibghatullah Muhammady ◽

Inge M. Sutjahja ◽

...

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Room Temperature ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes

Materials Science Forum ◽

10.4028/www.scientific.net/msf.102-104.563 ◽

1992 ◽

Vol 102-104 ◽

pp. 563-572 ◽

Cited By ~ 1

Author(s):

S.L. Rohde

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Plasma Characteristics

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