Low temperature, fast deposition of metallic titanium nitride films using plasma activated reactive evaporation

2005 ◽  
Vol 23 (3) ◽  
pp. 394-400 ◽  
Author(s):  
J. A. Montes de Oca Valero ◽  
Y. Le Petitcorps ◽  
J. P. Manaud ◽  
G. Chollon ◽  
F. J. Carrillo Romo ◽  
...  
Keyword(s):  
Low Temperature ◽  
Titanium Nitride ◽  
Metallic Titanium ◽  
Reactive Evaporation ◽  
Activated Reactive Evaporation

Deposition of indium nitride films by activated reactive evaporation process – a feasibility study

2005 ◽  
Vol 245 (1-4) ◽  
pp. 73-78 ◽  
Author(s):  
Sheetal J. Patil ◽  
Dhananjay S. Bodas ◽  
A.B. Mandale ◽  
S.A. Gangal
Keyword(s):  
Feasibility Study ◽  
Indium Nitride ◽  
Evaporation Process ◽  
Reactive Evaporation ◽  
Activated Reactive Evaporation

Low‐temperature processing of titanium nitride films by laser physical vapor deposition

1989 ◽  
Vol 54 (16) ◽  
pp. 1519-1521 ◽  
Author(s):  
N. Biunno ◽  
J. Narayan ◽  
S. K. Hofmeister ◽  
A. R. Srivatsa ◽  
R. K. Singh
Keyword(s):  
Low Temperature ◽  
Titanium Nitride ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Low Temperature Processing
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