Thickness dependence of structural and electrical characteristics of ZrO[sub 2] thin films as grown on Si by chemical-vapor deposition

2004 ◽  
Vol 22 (4) ◽  
pp. 1940 ◽  
Author(s):  
Shih-Sian Huang ◽  
Tai-Bor Wu
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Thickness Dependence ◽  
Electrical Characteristics

scholarly journals Thickness dependence of the properties of epitaxial MgB2 thin films grown by hybrid physical-chemical vapor deposition

2003 ◽  
Vol 82 (24) ◽  
pp. 4319-4321 ◽  
Author(s):  
A. V. Pogrebnyakov ◽  
J. M. Redwing ◽  
J. E. Jones ◽  
X. X. Xi ◽  
S. Y. Xu ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Thickness Dependence ◽  
Physical Chemical ◽  
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Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor

2014 ◽  
Vol 558 ◽  
pp. 112-117 ◽  
Author(s):  
Veronica S. Sulyaeva ◽  
Marina L. Kosinova ◽  
Yurii M. Rumyantsev ◽  
Fedor A. Kuznetsov ◽  
Valerii G. Kesler ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Electrical Characteristics ◽  
Boron Carbonitride
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