Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
2004 ◽
Vol 22
(1)
◽
pp. 8-12
◽
Keyword(s):
2019 ◽
Vol 40
(1)
◽
pp. 012806
◽
Keyword(s):
Keyword(s):
2011 ◽
Vol 158
(4)
◽
pp. G92
◽
2003 ◽
Vol 210
(3-4)
◽
pp. 231-239
◽
Keyword(s):
2005 ◽
Vol 80
◽
pp. 158-161
◽
Keyword(s):
2006 ◽
Vol 9
(6)
◽
pp. G200
◽
Keyword(s):
Keyword(s):
2021 ◽
Vol 39
(4)
◽
pp. 042404
Keyword(s):