Influence of the high-temperature “firing” step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells
2003 ◽
Vol 21
(5)
◽
pp. 2123
◽
Keyword(s):
2003 ◽
Vol 11
(2)
◽
pp. 125-130
◽
Keyword(s):
Keyword(s):
2013 ◽
Vol 16
(3)
◽
pp. 1014-1021
◽
Keyword(s):
2001 ◽
Vol 65
(1-4)
◽
pp. 317-323
◽
1999 ◽
Vol 7
(4)
◽
pp. 245-260
◽
Keyword(s):
Keyword(s):