Effect of H[sub 2] on the etch profile of InP/InGaAsP alloys in Cl[sub 2]/Ar/H[sub 2] inductively coupled plasma reactive ion etching chemistries for photonic device fabrication

2002 ◽  
Vol 20 (4) ◽  
pp. 1327 ◽  
Author(s):  
Sean L. Rommel ◽  
Jae-Hyung Jang ◽  
Wu Lu ◽  
Gabriel Cueva ◽  
Ling Zhou ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Device Fabrication ◽  
Ion Etching ◽  
Photonic Device ◽  
Inductively Coupled ◽  
Etch Profile ◽  
Ingaasp Alloys

Fabrication of GaN-based LEDs with 22° undercut sidewalls by inductively coupled plasma reactive ion etching

2013 ◽  
Vol 22 (10) ◽  
pp. 106802
Author(s):  
Bo Wang ◽  
Shi-Chen Su ◽  
Miao He ◽  
Hong Chen ◽  
Wen-Bo Wu ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled

scholarly journals Inductively Coupled Plasma Reactive Ion Etching of AlGaAsSb and InGaAsSb for Quaternary Antimonide MIM Thermophotovoltaics

2002 ◽  
Author(s):  
M. N. Palmisiano ◽  
G. M. Peake ◽  
R. J. Shul ◽  
C. I. Ashby ◽  
J. G. Cederberg ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled

Effect of the process parameters of inductively coupled plasma reactive ion etching on the fabrication of diamond nanotips

2014 ◽  
Vol 211 (10) ◽  
pp. 2343-2346 ◽  
Author(s):  
Hasan-al Mehedi ◽  
Vianney Mille ◽  
Jocelyn Achard ◽  
Ovidiu Brinza ◽  
Alix Gicquel
Keyword(s):  
Process Parameters ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled

Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma

2008 ◽  
Vol 103 (3) ◽  
pp. 034109 ◽  
Author(s):  
Z. Ren ◽  
P. J. Heard ◽  
J. M. Marshall ◽  
P. A. Thomas ◽  
S. Yu
Keyword(s):  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled

Gallium Nitride Nanorods Fabricated by Inductively Coupled Plasma Reactive Ion Etching

2002 ◽  
Vol 41 (Part 2, No. 8B) ◽  
pp. L910-L912 ◽  
Author(s):  
Chang-Chin Yu ◽  
Chen-Fu Chu ◽  
Juen-Yen Tsai ◽  
Hung Wen Huang ◽  
Tao-Hung Hsueh ◽  
...  
Keyword(s):  
Gallium Nitride ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled
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