Influence of nitrogen and temperature on the plasma deposition of fluorinated amorphous carbon films

2002 ◽  
Vol 20 (4) ◽  
pp. 1210-1215 ◽  
Author(s):  
L. Valentini ◽  
J. M. Kenny ◽  
R. M. Montereali ◽  
L. Lozzi ◽  
S. Santucci
Keyword(s):  
Amorphous Carbon ◽  
Plasma Deposition ◽  
Carbon Films ◽  
Amorphous Carbon Films

THE DETERMINATION OF SP3 FRACTION IN TETRAHEDRAL AMORPHOUS CARBON FILMS BY RAMAN AND X-RAY PHOTOELECTRON SPECTROSCOPY

2002 ◽  
Vol 16 (28n29) ◽  
pp. 4413-4417 ◽  
Author(s):  
DIHU CHEN ◽  
G. Y. JING ◽  
AIXIANG WEI
Keyword(s):  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Plasma Deposition ◽  
Carbon Films ◽  
Gaussian Peak ◽  
Xps Spectra ◽  
Raman Analysis ◽  
Amorphous Carbon Films ◽  
Tetrahedral Amorphous Carbon

Tetrahedral amorphous carbon films have been prepared by magnetic filtered plasma deposition system. The samples were deposited with negative bias voltage V b range from +20 V to -95 V. The relative fraction of sp 3-bonded carbon in these films was qualitatively and quantitatively estimated by a fitting of the Raman and XPS spectra, respectively. Raman results show that the sp 3 fraction of the films deposited in the range from -10 V to -50 V was estimated to be more than 80%. The C 1s spectra were consistently decomposed into the two gaussian components, one is at 284.4±0.1 eV corresponding to sp 2-hybridized bonds, and another is at 285.2±0.1 eV corresponding to sp 3-hybridized bond. The sp 3 content can be quantitatively calculated from the integrated area of the respective gaussian peak divided by the total area of the spectra. The comparison of XPS with Raman analysis, the trend of qualitative variation of sp 3 content with V b is in agreement. We concluded that XPS analysis is a useful method for quantitatively calculating sp 3 content in hydrogen-free tetrahedral amorphous carbon films.

The Influence of Magnetic Fields on the Properties of Amorphous Carbon Prepared by Plasma Deposition

1987 ◽  
Vol 98 ◽  
Author(s):  
R. H. Jarman ◽  
A. T. Howe
Keyword(s):  
Magnetic Field ◽  
Amorphous Carbon ◽  
Plasma Deposition ◽  
Protective Coatings ◽  
Carbon Films ◽  
Rf Discharge ◽  
Capacitively Coupled ◽  
Amorphous Carbon Films ◽  
Wide Range ◽  
Electrical Conductivities

ABSTRACTAmorphous carbon films exhibit a wide range of optical, electrical and mechanical properties which make them candidates for a number of applications such as protective coatings and insulators in electronic devices. We describe the effects of a magnetic field applied at the powered electrode in a capacitively coupled rf discharge on the optical and electrical properties of amorphous carbon films deposited on substrates mounted on both electrodes. In the case of substrates placed on the powered electrode, the film properties appear to be very sensitive to the magnetic field strength. At the highest magnetic field, the deposition rates are very much higher than those obtained in the absence of a magnetic field. The optical gap varies from 1.1 eV to 2.7 eV depending on the deposition conditions. The electrical conductivities of the films are very low and show a complex dependence on the applied electric field.

Plasma deposition of amorphous carbon films from CH4 atmospheres highly diluted in Ar

2002 ◽  
Vol 419 (1-2) ◽  
pp. 46-53 ◽  
Author(s):  
L.G. Jacobsohn ◽  
G. Capote ◽  
N.C. Cruz ◽  
A.R. Zanatta ◽  
F.L. Freire Jr
Keyword(s):  
Amorphous Carbon ◽  
Plasma Deposition ◽  
Carbon Films ◽  
Amorphous Carbon Films

Plasma deposition of amorphous carbon films from methane atmospheres highly diluted in argon

2001 ◽  
Vol 697 ◽  
Author(s):  
L. G. Jacobsohn ◽  
F. L. Freire
Keyword(s):  
Mechanical Properties ◽  
Raman Spectroscopy ◽  
Amorphous Carbon ◽  
Plasma Deposition ◽  
Carbon Films ◽  
X Ray Diffraction ◽  
Amorphous Carbon Films ◽  
X Ray ◽  
Partial Pressures ◽  
Amorphous Character

AbstractWe investigated the deposition, structure and mechanical properties of a-C:H films grown in Ar-CH4 mixtures with the Ar partial pressure ranging from 0 to 99 %. The deposition rate strongly decreased with progressive Ar dilution of the CH4 atmosphere. Films deposited in pure CH4 atmospheres have a hydrogen content of 20 at.% that showed a trend to decrease for lower CH4 partial pressures, while the density remained nearly constant at around 1.4x1023 at./cm3. Raman spectroscopy and x-ray diffraction revealed the amorphous character of the films. The compressive internal stress remained constant around 2.5 GPa and the hardness decreases for Ar rich precursor atmospheres.

Plasma deposition of amorphous carbon films on copper

2000 ◽  
Vol 359 (2) ◽  
pp. 275-282 ◽  
Author(s):  
S. Chiu ◽  
S. Turgeon ◽  
B. Terreaul ◽  
A. Sarkissian
Keyword(s):  
Amorphous Carbon ◽  
Plasma Deposition ◽  
Carbon Films ◽  
Amorphous Carbon Films

Scanning Tunneling Microscopy of Amorphous Carbon Films

1990 ◽  
Vol 48 (1) ◽  
pp. 318-319
Author(s):  
Mircea Fotino ◽  
D.C. Parks
Keyword(s):  
Scanning Tunneling Microscopy ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Atomic Scale ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Amorphous Carbon Films ◽  
Image Optimization ◽  
Step Procedure ◽  
Stm Images

In the last few years scanning tunneling microscopy (STM) has made it possible and easily accessible to visualize surfaces of conducting specimens at the atomic scale. Such performance allows the detailed characterization of surface morphology in an increasing spectrum of applications in a wide variety of fields. Because the basic imaging process in STM differs fundamentally from its equivalent in other well-established microscopies, good understanding of the imaging mechanism in STM enables one to grasp the correct information content in STM images. It thus appears appropriate to explore by STM the structure of amorphous carbon films because they are used in many applications, in particular in the investigation of delicate biological specimens that may be altered through the preparation procedures.All STM images in the present study were obtained with the commercial instrument Nanoscope II (Digital Instruments, Inc., Santa Barbara, California). Since the importance of the scanning tip for image optimization and artifact reduction cannot be sufficiently emphasized, as stressed by early analyses of STM image formation, great attention has been directed toward adopting the most satisfactory tip geometry. The tips used here consisted either of mechanically sheared Pt/Ir wire (90:10, 0.010" diameter) or of etched W wire (0.030" diameter). The latter were eventually preferred after a two-step procedure for etching in NaOH was found to produce routinely tips with one or more short whiskers that are essentially rigid, uniform and sharp (Fig. 1) . Under these circumstances, atomic-resolution images of cleaved highly-ordered pyro-lytic graphite (HOPG) were reproducibly and readily attained as a standard criterion for easily recognizable and satisfactory performance (Fig. 2).

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