Dry etching of amorphous-Si gates for deep sub-100 nm silicon-on-insulator complementary metal–oxide semiconductor
2002 ◽
Vol 20
(1)
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pp. 191
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2011 ◽
Vol 32
(7)
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pp. 076001
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2009 ◽
Vol 27
(21)
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pp. 4892-4896
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