Image metrology and system controls for scanning beam interference lithography

2001 ◽  
Vol 19 (6) ◽  
pp. 2335 ◽  
Author(s):  
Carl G. Chen ◽  
Paul T. Konkola ◽  
Ralf K. Heilmann ◽  
G. S. Pati ◽  
Mark L. Schattenburg
Keyword(s):  
Interference Lithography ◽  
Scanning Beam ◽  
Image Metrology ◽  
Scanning Beam Interference Lithography

Nanometer-accurate grating fabrication with scanning beam interference lithography

2002 ◽  
Author(s):  
Carl G. Chen ◽  
Paul T. Konkola ◽  
Ralf K. Heilmann ◽  
Chulmin Joo ◽  
Mark L. Schattenburg
Keyword(s):  
Interference Lithography ◽  
Grating Fabrication ◽  
Scanning Beam ◽  
Scanning Beam Interference Lithography

Image grating metrology using phase-stepping interferometry in scanning beam interference lithography

2016 ◽  
Author(s):  
Minkang Li ◽  
Changhe Zhou ◽  
Chunlong Wei ◽  
Wei Jia ◽  
Yancong Lu ◽  
...  
Keyword(s):  
Interference Lithography ◽  
Scanning Beam ◽  
Phase Stepping ◽  
Scanning Beam Interference Lithography

Beam drift error and control technology for scanning beam interference lithography

2017 ◽  
Vol 56 (14) ◽  
pp. 4138 ◽  
Author(s):  
Wei Wang ◽  
Ying Song ◽  
Shan Jiang ◽  
Mingzhong Pan ◽  
Bayanheshig
Keyword(s):  
Interference Lithography ◽  
Control Technology ◽  
Scanning Beam ◽  
Scanning Beam Interference Lithography ◽  
And Control

Dynamic Exposure Model of Scanning Beam Interference Lithography

2018 ◽  
Author(s):  
Sen Lu ◽  
Kaiming Yang ◽  
Yu Zhu ◽  
Leijie Wang ◽  
Ming Zhang
Keyword(s):  
Three Dimensional ◽  
Exposure Dose ◽  
Exposure Model ◽  
Interference Lithography ◽  
Nonlinear Properties ◽  
Scanning Beam ◽  
Groove Profile ◽  
Ca Model ◽  
Scanning Beam Interference Lithography ◽  
Dynamic Exposure

To obtain desired photoresist grating by scanning beam interference lithography (SBIL), a precise exposure dose is demanded. For it is difficult to apply the real-time exposure monitoring technology in SBIL, a precise dynamic exposure model is needed to predict the groove profile of the photoresist grating. In this paper, a novel dynamic exposure model is established based on the characteristics of SBIL. Considering the nonlinear properties of the photoresist, a three-dimensional development process simulation is conducted based on cellular automata (CA) model. Based on this model, the influence mechanism of exposure parameters on groove profile can be analyzed, which provides an effective analysis method for optimizing exposure parameters of SBIL.

Yaw error correction of ultra-precision stage for scanning beam interference lithography systems

2018 ◽  
Vol 232 (7) ◽  
pp. 869-878
Author(s):  
Sen Lu ◽  
Kaiming Yang ◽  
Yu Zhu ◽  
Leijie Wang ◽  
Ming Zhang ◽  
...  
Keyword(s):  
Error Correction ◽  
Correction Function ◽  
Interference Lithography ◽  
Grating Fabrication ◽  
Scanning Beam ◽  
Key Factor ◽  
Ultra Precision ◽  
Dual Stage ◽  
Scanning Beam Interference Lithography ◽  
Abbe Error

The stage yaw error is a key factor affecting the phase distortion of gratings produced by scanning beam interference lithography system. In order to solve this problem, a coarse-fine dual-stage mechanism is proposed, in which an ultra-precision fine positioning stage with yaw error correction function is developed. To achieve nanoscale positioning and sub-microradian yaw motion accuracy, four Lorentz motors are used to drive the fine stage. The internal coupling factors and the mechanism of Lorentz motors motion control are analyzed. Besides, the Abbe error caused by the yaw error is investigated. Positioning and scanning experiments are conducted and the outcomes show that maximum yaw error is 0.33 μrad during constant velocity scanning, which completely meets the grating fabrication requirements.

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