100 nm gate hole openings for low voltage driving field emission display applications

Author(s):  
J. O. Choi ◽  
A. I. Akinwande ◽  
H. I. Smith
2011 ◽  
Vol 509 (21) ◽  
pp. 6317-6320 ◽  
Author(s):  
Xiaojun Wang ◽  
Mingchang Zhang ◽  
Hui Ding ◽  
Huili Li ◽  
Zhuo Sun

2001 ◽  
Vol 667 ◽  
Author(s):  
Jung-Woo Byun ◽  
Byung-Kyo Lee ◽  
Dong-Kuk Kim ◽  
Seong-Gu Kang ◽  
Seung-Youl Kang ◽  
...  

ABSTRACTCaTiO3:Pr3+ as an oxide phosphor is expected to be applied for a field emission display(FED) due to its relatively high conductivity. For the practical use, however, the CL intensity of CaTiO3:Pr3+ has to be enhanced. We introduced Ga3+ as a co-activator into the phosphor and investigated the CL characteristics with various Ga3+ concentrations. The CL intensity of CaTiO3:Pr3+ was remarkably increased when Ti4+ atom was replaced by the Ga3+. When the Ga3+ concentration is 5 times of Pr3+ molar concentration, the emission intensity of the CaTiO3:Pr3+ phosphor with Ga3+ is about 5 times higher than Ga3+-free samples. So, it was concluded that the addition of Ga3+ is essential to enhance CL property at low voltage. We proposed the following mechanism that excitation into the host lattice leads to the formation of electrons in the conduction band and holes in the valence band. The electrons in the conduction band recombine with the holes trapped at Ga3+ and this energy is effectively transferred to Pr3+ ion, which gives its own characteristic red emission.


Author(s):  
V. A. Bolchouchine ◽  
E. T. Goldburt ◽  
B. N. Levonovitch ◽  
V. N. Litchmanova ◽  
N. P. Sochtine

1997 ◽  
Vol 471 ◽  
Author(s):  
J. M. Kim ◽  
J. P. Hong ◽  
N. S. Park ◽  
J. E. Jung ◽  
Y. W. Jin ◽  
...  

ABSTRACTWe present performance results of 4-inch full-color field emission display (FED) devices which are constructed by using Spindt type arrays with 80,000,000 Mo-metal tips, spacers, uniquely-developed low voltage color phosphors. Spindt type microtips with less than 1.1 urn in hole size are fabricated using a total internal reflection (TIR) holographic lithograpy method. Each color phosphor is electrophoretically deposited on the ITO line. The spacer which is screen-printed is characterized by a 3-dimentional surface analysis system. Electron emission pattern and luminance test of each pixel without cross talk are analyzed under different gate voltages. In addition, the total pressure and residual gas distributions inside the panel are investigated at various gap sizes between the cathode and anode plates.


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